Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 8/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL717501 | 0.83 | HSD11B1 (0.33) | HSD11B1MEN1KMT2A | |
| SCHEMBL2477129 | 0.81 | HSD11B1 (0.33) | HSD11B1MEN1KMT2A | |
| SCHEMBL6864996 | 0.74 | — | — | |
| SCHEMBL7201984 | 0.72 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL4404945 | 0.71 | CYP2D6 (0.32) | — | |
| SCHEMBL1151137 | 0.71 | — | — | |
| SCHEMBL1349275 | 0.70 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL7201437 | 0.69 | CYP2D6 (0.38) | HSD11B1 | |
| SCHEMBL29047689 | 0.69 | PKM (0.33) | HSD11B1 | |
| SCHEMBL2476552 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6720129-B2 | PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS | HYNIX SEMICONDUCTOR INC (KR) | 2004-04-13 | — | — | US | claimed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | claimed |
| US-20130095425-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-18 | — | — | US | disclosed |
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | disclosed |
| US-6642336-B1 | Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-11-04 | — | — | US | disclosed |
| US-6596459-B1 | Photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-22 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |