Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 1/20 | 0.38 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.38 |
| ▸ | ELANE | P08246 | 3/20 | 0.36 |
| ▸ | PARP1 | P09874 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | MEN1 | O00255 | 4/20 | 0.34 |
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | RAB9A | P51151 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.34 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.34 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.34 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.34 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 4/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217014 | 0.82 | DNMT1 (0.47) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL7171073 | 0.82 | DNMT1 (0.47) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL57037 | 0.77 | DNMT1 (0.53) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL7486488 | 0.76 | DNMT1 (0.52) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL11542348 | 0.76 | DNMT1 (0.52) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL218236 | 0.76 | SMN1; SMN2 (0.46) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6306910 | 0.76 | DNMT1 (0.44) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| Phthalimide SCHEMBL28880569 | 0.75 | GSK3B (0.48) | ALDH1A1KMT2ASMN1; SMN2KDM4EMEN1 | |
| SCHEMBL7166848 | 0.74 | ALDH1A1 (0.49) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 | |
| Phosphoric Acid SCHEMBL2289263 | 0.73 | PARP1 (0.46) | DNMT1PARP1ALDH1A1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | disclosed |
| WO-2011101259-A2 | SULFONAMIDE-CONTAINING TOPCOAT AND PHOTORESIST ADDITIVE COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011101260-A2 | SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011054557-A1 | BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-12 | — | — | WO | disclosed |
| WO-2011054572-A1 | SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-12 | — | — | WO | disclosed |
| WO-2011023497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | WO | disclosed |
| WO-2011020675-A1 | STABILIZERS FOR VINYL ETHER RESIST FORMULATIONS FOR IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | WO | disclosed |