Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPO | P22079 | 2/20 | 0.67 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.67 |
| ▸ | TAS2R38 | P59533 | 2/20 | 0.67 |
| ▸ | MPO | P05164 | 2/20 | 0.67 |
| ▸ | TPO | P07202 | 1/20 | 0.67 |
| ▸ | TSHR | P16473 | 1/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.61 |
| ▸ | MAPT | P10636 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.51 |
| ▸ | CYB5R3 | P00387 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.45 |
| ▸ | BAZ2B | Q9UIF8 | 1/20 | 0.45 |
| ▸ | GPR84 | Q9NQS5 | 5/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylthiouracil SCHEMBL5493716 | 0.80 | LPO (1.00) | LPOCYP2C19TAS2R38MPOTPO | |
| Propylthiouracil SCHEMBL41239 | 0.80 | LPO (1.00) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL11741161 | 0.80 | CYP2C19 (0.67) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL23160962 | 0.75 | LPO (0.71) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL29948466 | 0.74 | KMT2A (0.97) | LPOCYP2C19TAS2R38MPOTPO | |
| Propylthiouracil SCHEMBL13723721 | 0.73 | LPO (0.83) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL10489669 | 0.71 | LPO (0.55) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL21328426 | 0.69 | TSHR (0.53) | LPOCYP2C19TAS2R38MPOTPO | |
| Propylthiouracil SCHEMBL20771755 | 0.69 | LPO (0.73) | LPOCYP2C19TAS2R38MPOTPO | |
| SCHEMBL11582733 | 0.69 | KMT2A (0.82) | LPOCYP2C19TAS2R38MPOTPO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| US-20250244669-A1 | COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | EMD PERFORMANCE MATERIALS CORP. | 2025-07-31 | — | — | US | disclosed |
| US-12360453-B2 | PAG-free positive chemically amplified resist composition and methods of using the same | MERCK PATENT GMBH (DE) | 2025-07-15 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| EP-4433873-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118642327-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-09-13 | — | — | CN | disclosed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | disclosed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | disclosed |
| US-20190278178-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO INSTITUTE OF TECHNOLOGY (JP) | 2019-09-12 | — | — | US | disclosed |
| EP-2929397-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-10-14 | — | — | EP | disclosed |
| CN-104781731-A | Positive working photosensitive material | AZ ELECTRONIC MATERIALS LUXEMBOURG SARL | 2015-07-15 | — | — | CN | disclosed |
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | disclosed |
| WO-2014086846-A2 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2014-06-12 | — | — | WO | disclosed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | disclosed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12619149-B2 | DNQ-free chemically amplified resist composition | POLQ, RECQL, RPA1 | LPO 3512/4885CYP2C19 3727/4885TAS2R38 1006/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.