SCHEMBL1173779

SCHEMBL1173779

CCCc1cc(C(=O)O)c(O)c(O)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 4/20 0.47
PTPN11 Q06124 1/20 0.47
HMGB1 P09429 3/20 0.43
CXCL12 P48061 2/20 0.43
MCL1 Q07820 1/20 0.42
HPGD P15428 2/20 0.42
HSD17B10 Q99714 2/20 0.42
ALDH1A1 P00352 1/20 0.42
AKR1C2 P52895 1/20 0.40
AKR1C1 Q04828 1/20 0.40
PRKCI P41743 1/20 0.40
HCAR2 Q8TDS4 1/20 0.40
KAT8 Q9H7Z6 2/20 0.39
PPARA Q07869 1/20 0.39
LDHA P00338 1/20 0.39
LDHB P07195 1/20 0.39
CYP2C9 P11712 1/20 0.39
TSHR P16473 1/20 0.39
ALOX12 P18054 1/20 0.39
ATIC P31939 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15375739 0.88 HMGB1 (0.48) PTPN1HMGB1CXCL12HPGDHSD17B10
SCHEMBL29284693 0.86 KAT8 (0.53) MCL1HSD17B10HCAR2KAT8PPARA
SCHEMBL40166 0.83 PTPN1 (0.59) PTPN1PTPN11HMGB1CXCL12MCL1
SCHEMBL4958008 0.81 PTPN1 (0.50) PTPN1PTPN11HMGB1CXCL12MCL1
SCHEMBL5788972 0.81 PRKCI (0.51) PTPN1PTPN11HMGB1MCL1HPGD
SCHEMBL2926460 0.80 TDP1 (0.47) PTPN1PTPN11HMGB1CXCL12MCL1
SCHEMBL9640002 0.78 HDAC1 (0.49) PTPN1PTPN11HPGDHSD17B10ALDH1A1
SCHEMBL9639626 0.78 PTPN1 (0.41) PTPN1PTPN11MCL1PRKCILMNA
SCHEMBL14135765 0.78 PTPN1 (0.41) PTPN1PTPN11HMGB1CXCL12MCL1
SCHEMBL15524242 0.77 MAPT (0.56) PTPN1PTPN11MCL1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111970929-B Active ingredient combinations having insecticidal, nematicidal and acaricidal properties 拜耳公司 2022-12-06 CN disclosed
US-8035952-B2 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD. (JP) 2011-10-11 US disclosed
EP-1798259-B1 CONDUCTIVE COMPOSITION AND PROCESS FOR PRODUCING THE SAME, ANTISTATIC PAINT, ANTISTATIC COATING AND ANTISTATIC FILM, OPTICAL FILTER, OPTICAL INFORMATION RECORDING MEDIUM, AND CAPACITOR AND PROCESS FOR PRODUCING THE SAME SHINETSU POLYMER CO (JP) 2011-10-05 EP disclosed
US-8021579-B2 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD. (JP) 2011-09-20 US disclosed
US-20110038095-A1 CONDUCTIVE COMPOSITION AND PRODUCTION METHOD THEREOF, ANTISTATIC COATING MATERIAL, ANTISTATIC COATING, ANTISTATIC FILM, OPTICAL FILTER, AND OPTICAL INFORMATION RECORDING MEDIUM, AND CAPACITORS AND PRODUCTION METHOD THEREOF SHIN-ETSU POLYMER CO., LTD. (JP) 2011-02-17 US disclosed
US-20110033651-A1 CONDUCTIVE COMPOSITION AND PRODUCTION METHOD THEREOF, ANTISTATIC COATING MATERIAL, ANTISTATIC COATING, ANTISTATIC FILM, OPTICAL FILTER, AND OPTICAL INFORMATION RECORDING MEDIUM, AND CAPACITORS AND PRODUCTION METHOD THEREOF SHIN-ETSU POLYMER CO., LTD. (JP) 2011-02-10 US disclosed
US-7842196-B2 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD. (JP) 2010-11-30 US disclosed
EP-1798259-A1 CONDUCTIVE COMPOSITION AND PROCESS FOR PRODUCING THE SAME, ANTISTATIC PAINT, ANTISTATIC COATING AND ANTISTATIC FILM, OPTICAL FILTER, OPTICAL INFORMATION RECORDING MEDIUM, AND CAPACITOR AND PROCESS FOR PRODUCING THE SAME SHIN-ETSU POLYMER CO., LTD. (JP) 2007-06-20 EP disclosed
US-20060076541-A1 Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof SHIN-ETSU POLYMER CO., LTD. 2006-04-13 US disclosed