SCHEMBL1174019

SCHEMBL1174019

CC(OC=O)OCCOC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.49

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.43
PRKCA P17252 1/20 0.43
NPSR1 Q6W5P4 2/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 1/20 0.40
LMNA P02545 1/20 0.39
PKM P14618 1/20 0.39
CYP17A1 P05093 4/20 0.38
CYP19A1 P11511 4/20 0.38
ATM Q13315 1/20 0.38
TSHR P16473 1/20 0.37
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13191131 0.81 PRKCA (0.51) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL23780305 0.81 ALDH1A1 (0.48) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1174006 0.81 PRKCA (0.46) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1323622 0.80 PRKCA (0.43) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1322672 0.78 PRKCA (0.44) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL4371197 0.78 ALDH1A1 (0.49) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL7087045 0.78 ALDH1A1 (0.46) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL12132675 0.78 ALDH1A1 (0.58) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1174646 0.78 ALDH1A1 (0.35) ALDH1A1NPSR1MEN1KMT2ALMNA
SCHEMBL15984183 0.75 ALDH1A1 (0.47) ALDH1A1NPSR1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8475999-B2 Compound and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-20110039208-A1 PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed
US-20050158656-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2005-07-21 US disclosed
US-20050100819-A1 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME RCOR3, RCN1, HRH4 ALDH1A1 1871/4885PRKCA 4757/4885NPSR1 2214/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.