SCHEMBL1174006

SCHEMBL1174006

CC(O[C]=O)OCCOC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.49

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.46
ALDH1A1 P00352 7/20 0.43
NPSR1 Q6W5P4 2/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 2/20 0.40
PKM P14618 1/20 0.39
CYP17A1 P05093 4/20 0.38
CYP19A1 P11511 4/20 0.38
ATM Q13315 1/20 0.38
LMNA P02545 1/20 0.36
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23780305 0.81 ALDH1A1 (0.48) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL13191131 0.81 PRKCA (0.51) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL1174019 0.81 ALDH1A1 (0.43) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL1322672 0.78 PRKCA (0.44) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL4371197 0.78 ALDH1A1 (0.49) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL7087045 0.78 ALDH1A1 (0.46) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL12132675 0.78 ALDH1A1 (0.58) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL1323622 0.77 PRKCA (0.43) PRKCAALDH1A1NPSR1MEN1KMT2A
SCHEMBL1174643 0.77 NPSR1 (0.35) ALDH1A1NPSR1MEN1KMT2ALMNA
SCHEMBL15984183 0.75 ALDH1A1 (0.47) ALDH1A1NPSR1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8475999-B2 Compound and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-20110039208-A1 PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed
US-20050158656-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2005-07-21 US disclosed
US-20050100819-A1 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-12 US disclosed
US-6818379-B2 SULFONIUM SALT REPRESENTED BY THE FOLLOWING FORMULA (I): WHEREIN Q1, Q2 AND Q3 EACH INDEPENDENTLY REPRESENT HYDROGEN, HYDROXY, ALKYL HAVING 1 TO 6 CARBON ATOMS, OR ALKOXY HAVING 1 TO 6 CARBON ATOMS, BUT ALL OF Q1, Q2 AND Q3 ARE NOT THE SAME; SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-16 US disclosed
US-20030148211-A1 Sulfonium salt and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME RCOR3, RCN1, HRH4 PRKCA 4757/4885ALDH1A1 1871/4885NPSR1 2214/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.