SCHEMBL4371197

SCHEMBL4371197

CC(OCCOC(=O)C12CC3CC(CC(C3)C1)C2)C(=O)O

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.49
PRKCA P17252 1/20 0.46
NPSR1 Q6W5P4 2/20 0.44
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
MAPT P10636 1/20 0.43
LMNA P02545 1/20 0.43
PKM P14618 1/20 0.41
CYP17A1 P05093 3/20 0.40
CYP19A1 P11511 3/20 0.40
RECQL P46063 1/20 0.40
ATM Q13315 1/20 0.40
ITGB1 P05556 1/20 0.39
ITGA4 P13612 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7087045 0.88 ALDH1A1 (0.46) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL13191131 0.84 PRKCA (0.51) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL23780305 0.84 ALDH1A1 (0.48) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL12132675 0.82 ALDH1A1 (0.58) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1174006 0.78 PRKCA (0.46) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1174019 0.78 ALDH1A1 (0.43) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL4370709 0.78 ALDH1A1 (0.41) ALDH1A1NPSR1MEN1KMT2ACYP17A1
SCHEMBL16682462 0.77 ALDH1A1 (0.47) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1322672 0.76 PRKCA (0.44) ALDH1A1PRKCANPSR1MEN1KMT2A
SCHEMBL1323622 0.75 PRKCA (0.43) ALDH1A1PRKCANPSR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7625689-B2 better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-12-01 US disclosed
US-7576223-B2 Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-18 US disclosed
US-20080269506-A1 Chemical amplification type resist composition YAMADA AIRI 2008-10-30 US disclosed
US-7396899-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL CO., LTD. (JP) 2008-07-08 US disclosed
US-20070123674-A1 Chemical amplification type resist composition YAMADA AIRI 2007-05-31 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-7160669-B2 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-09 US disclosed
US-7135268-B2 Using aromatic sulfonate compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-14 US disclosed
US-20060160017-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-07-20 US disclosed
US-7001706-B2 Sulfonate and a resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-02-21 US disclosed
US-6951706-B2 Sulfonate and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-10-04 US disclosed
US-20050014095-A1 Sulfonate and a resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-01-20 US disclosed
US-20040152009-A1 Sulfonate and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2004-08-05 US disclosed
US-20040138353-A1 Chemical amplification type resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-15 US disclosed
US-20040029037-A1 Amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-02-12 US disclosed
US-20030180659-A1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-09-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080269506-A1 Chemical amplification type resist composition ASIC1, POLR2B, POLR2A ALDH1A1 1431/4885PRKCA 1524/4885NPSR1 2485/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.