SCHEMBL11917852

SCHEMBL11917852

COS(=O)(=O)C(F)(F)COC(=O)CC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11917866 0.82 NAAA (0.33)
SCHEMBL8927992 0.82 ALDH1A1 (0.30)
SCHEMBL3840822 0.81
SCHEMBL11917851 0.79 ALDH1A1 (0.38)
SCHEMBL12938411 0.79
SCHEMBL10144862 0.78 ALDH1A1 (0.34)
SCHEMBL11917857 0.77 DGKA (0.41)
SCHEMBL11917849 0.77
SCHEMBL14680920 0.76 DGKA (0.47)
SCHEMBL11917847 0.74 ALDH1A1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8771922-B2 Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2014-07-08 US disclosed
US-20120251952-A1 COPOLYMER FOR RESIST COMPRISING NOVEL ACRYL BASED MONOMER AND RESIN COMPOSITION FOR RESIST COMPRISING THE SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-10-04 US disclosed
US-8241831-B2 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-08-14 US disclosed
US-20090291390-A1 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2009-11-26 US disclosed