SCHEMBL8927992

SCHEMBL8927992

CC(C)(C)CC(=O)OCC(F)(F)S(=O)(=O)O

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3840822 0.98
SCHEMBL11917852 0.82
SCHEMBL12016475 0.81 NAAA (0.35) ALDH1A1L3MBTL1
SCHEMBL26932306 0.80 HTT (0.30)
SCHEMBL14228085 0.80 ALDH1A1 (0.34) ALDH1A1L3MBTL1
SCHEMBL8927977 0.78 ALDH1A1 (0.40) ALDH1A1L3MBTL1
SCHEMBL16168110 0.77 PRKCA (0.31)
SCHEMBL12994724 0.77 ALDH1A1 (0.40) ALDH1A1L3MBTL1
SCHEMBL10246540 0.77 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL15071771 0.77 ALDH1A1 (0.32) ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9321875-B2 Additive for resist and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2016-04-26 US disclosed
US-9063411-B2 Additive for resist and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2015-06-23 US disclosed
US-8980526-B2 Hydrophilic photoacid generator and resist composition comprising same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2015-03-17 US disclosed
US-20130177852-A1 HYDROPHILIC PHOTOACID GENERATOR AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-11 US disclosed
US-20130171561-A1 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-04 US disclosed
US-20130171560-A1 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-07-04 US disclosed
US-20130164674-A1 NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2013-06-27 US disclosed
US-8241831-B2 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-08-14 US disclosed
US-8187790-B2 Polymer for resist and resist composition manufactured using the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-05-29 US disclosed
US-20100081079-A1 POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-04-01 US disclosed
US-20090291390-A1 Acid generating agent for chemically amplified resist compositions KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2009-11-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090291390-A1 Acid generating agent for chemically amplified resist compositions ABCC1, CBR1, ARSA ALDH1A1 102/4885L3MBTL1 3650/4885
US-20130164674-A1 NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME SMC1A, SMCHD1, SMC2 ALDH1A1 652/4885L3MBTL1 239/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.