SCHEMBL11964046

SCHEMBL11964046

CC(C)(CS(=O)(=O)c1ccccc1)OC(=O)N(C1CCCCC1)C1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
ALDH1A1 P00352 2/20 0.44
KDM4E B2RXH2 1/20 0.44
POLB P06746 1/20 0.41
RAB9A P51151 1/20 0.41
NPSR1 Q6W5P4 2/20 0.40
HSD11B1 P28845 1/20 0.40
CCR5 P51681 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
LMNA P02545 1/20 0.39
MAPT P10636 1/20 0.39
HTT P42858 1/20 0.39
HPGD P15428 2/20 0.39
USP2 O75604 1/20 0.39
HSD17B10 Q99714 1/20 0.39
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15181330 0.87 KMT2A (0.47) MEN1KMT2AALDH1A1KDM4EPOLB
SCHEMBL13359969 0.79 HSD11B1 (0.45) MEN1KMT2AALDH1A1RAB9ANPSR1
SCHEMBL12726416 0.77 NPC1 (0.41) KMT2AALDH1A1RAB9ANPSR1L3MBTL1
SCHEMBL8738164 0.76 HSD11B1 (0.46) ALDH1A1POLBRAB9ANPSR1HSD11B1
SCHEMBL13172360 0.73 SMN1; SMN2 (0.55) MEN1KMT2AALDH1A1KDM4EPOLB
SCHEMBL1852429 0.72 ADH1C (0.38) MEN1KMT2AALDH1A1NPSR1HSD11B1
SCHEMBL8395076 0.72 CCR5 (0.43) MEN1KMT2AALDH1A1KDM4EPOLB
SCHEMBL24292458 0.71 ADH1C (0.35) MEN1KMT2ANPSR1HSD11B1L3MBTL1
SCHEMBL13172555 0.70 GPR119 (0.53) KDM4E
SCHEMBL4148102 0.70 HSD11B1 (0.46) MEN1KMT2AALDH1A1POLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US disclosed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US disclosed