SCHEMBL11969337

SCHEMBL11969337

CCCCCCCCCC[Si](C)(C)N(C)C

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.42
THRB P10828 1/20 0.42
DNM1 Q05193 8/20 0.42
ALDH1A1 P00352 3/20 0.33
LMNA P02545 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HSD17B10 Q99714 1/20 0.33
SLC22A1 O15245 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL422635 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL30239111 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL30238622 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL6246621 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL28341834 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL11969287 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL7922841 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL258804 1.00 TSHR (0.42) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL422241 0.89 DNM1 (0.33) TSHRTHRBDNM1LMNA
SCHEMBL15182784 0.89 ALDH1A1 (0.30) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111886676-B Method for treating surface of wafer and composition therefor 中央硝子株式会社 2024-09-27 CN claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
US-11603485-B2 Surface treatment method of wafer and composition used for said method CENTRAL GLASS COMPANY, LIMITED (JP) 2023-03-14 US claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US claimed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US claimed
CN-118974894-A Surface treatment composition and method for producing wafer 中央硝子株式会社 2024-11-15 CN disclosed
CN-111886676-B Method for treating surface of wafer and composition therefor 中央硝子株式会社 2024-09-27 CN disclosed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US disclosed
US-11603485-B2 Surface treatment method of wafer and composition used for said method CENTRAL GLASS COMPANY, LIMITED (JP) 2023-03-14 US disclosed
US-11155717-B2 Storage container storing liquid composition and method for storing liquid composition FUJIFILM CORPORATION (JP) 2021-10-26 US disclosed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US disclosed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO disclosed
US-20170062203-A1 Method of Preparing Liquid Chemical for Forming Protective Film CENTRAL GLASS CO LTD (JP) 2017-03-02 US disclosed
US-20140339321-A1 PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER CENTRAL GLASS COMPANY, LIMITED (JP) 2014-11-20 US disclosed
US-20140311379-A1 Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2014-10-23 US disclosed
US-8828144-B2 Process for cleaning wafers Central Grass Company, Limited (JP) 2014-09-09 US disclosed
US-20130255534-A1 Method of Preparing Liquid Chemical for Forming Protective Film CENTRAL GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
US-20120211025-A1 PROCESS FOR CLEANING WAFERS CENTRAL GLASS COMPANY, LIMITED (JP) 2012-08-23 US disclosed