Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTB4R | Q15722 | 5/20 | 0.48 |
| ▸ | LTB4R2 | Q9NPC1 | 5/20 | 0.48 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.47 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.45 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.44 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.43 |
| ▸ | IGLV6-57 | P01721 | 1/20 | 0.42 |
| ▸ | PPARA | Q07869 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11999023 | 0.88 | ALDH1A1 (0.46) | LTB4RLTB4R2FFAR1HDAC4HDAC2 | |
| SCHEMBL11999024 | 0.86 | MTNR1A (0.43) | LTB4RLTB4R2HDAC4HDAC2HDAC8 | |
| SCHEMBL18713464 | 0.84 | HDAC4 (0.49) | HDAC4HDAC2HDAC8PTGS1SLC7A5 | |
| SCHEMBL11999039 | 0.84 | SLC7A5 (0.44) | LTB4RLTB4R2HDAC4HDAC2HDAC8 | |
| SCHEMBL10182834 | 0.83 | LTB4R (0.61) | LTB4RLTB4R2FFAR1ALOX5SLC7A5 | |
| SCHEMBL11996670 | 0.83 | PTGS1 (0.58) | FFAR1HDAC4HDAC2HDAC8ALOX5 | |
| SCHEMBL25636664 | 0.81 | HDAC4 (0.46) | HDAC4HDAC2HDAC8PTGS1SLC7A5 | |
| SCHEMBL11999022 | 0.81 | SLC6A4 (0.39) | HDAC4HDAC2HDAC8PPARA | |
| SCHEMBL825481 | 0.80 | HDAC4 (0.45) | HDAC4HDAC2HDAC8ALOX5PTGS1 | |
| SCHEMBL9325376 | 0.80 | HDAC4 (0.45) | HDAC4HDAC2HDAC8ALOX5PTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120214091-A1 | RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-23 | — | — | US | disclosed |