SCHEMBL12014450

SCHEMBL12014450

CC(C)c1ccc(C(=O)OC2C3CC4C(=O)OC2C4C3)c2ccccc12

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ HTR3A P46098 13/20 0.32
▸ HTR3E A5X5Y0 9/20 0.32
▸ HTR3B O95264 9/20 0.32
▸ HTR3D Q70Z44 9/20 0.32
▸ HTR3C Q8WXA8 9/20 0.32
▸ OPRK1 P41145 1/20 0.31
▸ ACE2 Q9BYF1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12015392 0.84 CNR2 (0.34) HTR3AHTR3EHTR3BHTR3DHTR3C
SCHEMBL12014447 0.82 KDM4E (0.31) HTR3AHTR3EHTR3BHTR3DHTR3C
SCHEMBL12014449 0.77 HTR3E (0.30) HTR3AHTR3EHTR3BHTR3DHTR3C
SCHEMBL13759736 0.75 SOAT1 (0.30) —
SCHEMBL15084174 0.73 — —
SCHEMBL9925266 0.73 — —
SCHEMBL13178003 0.72 — —
SCHEMBL12996633 0.72 — —
SCHEMBL23191379 0.71 PRKCA (0.35) —
SCHEMBL9885239 0.71 PRKCA (0.35) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778592-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-15 — — US disclosed
US-8652756-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-18 — — US disclosed
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 — — US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 — — US disclosed
US-20130056654-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 — — US disclosed
US-20120220112-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-30 — — US disclosed
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