Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | RIPK1 | Q13546 | 4/20 | 0.33 |
| ▸ | AKR1C3 | P42330 | 4/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | PER2 | O15055 | 1/20 | 0.32 |
| ▸ | MITF | O75030 | 1/20 | 0.31 |
| ▸ | GPR174 | Q9BXC1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12015347 | 0.95 | PER2 (0.34) | RIPK1AKR1C3HPGDSMN1; SMN2GAA | |
| SCHEMBL12015339 | 0.81 | RIPK1 (0.33) | RIPK1SMN1; SMN2MITF | |
| SCHEMBL12015341 | 0.78 | CHRM2 (0.35) | RIPK1SMN1; SMN2KMT2A | |
| SCHEMBL12015346 | 0.76 | RIPK1 (0.33) | RIPK1KMT2A | |
| SCHEMBL12015340 | 0.76 | RIPK1 (0.38) | RIPK1SMN1; SMN2KMT2A | |
| SCHEMBL12764280 | 0.75 | CA1 (0.37) | CA1CA2CA4AKR1C3HPGD | |
| SCHEMBL23002163 | 0.74 | ACE (0.35) | AKR1C3HPGDSMN1; SMN2GAARECQL | |
| SCHEMBL8378678 | 0.74 | CREBBP (0.39) | AKR1C3HPGDGAARECQLPER2 | |
| SCHEMBL24366649 | 0.73 | CHRM2 (0.41) | HPGD | |
| SCHEMBL15017885 | 0.73 | CHRM2 (0.41) | HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9405191-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160077433-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-17 | — | — | US | disclosed |
| US-8859182-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8563217-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130022910-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219898-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219907-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |