SCHEMBL12015381

SCHEMBL12015381

N#CC1CC2CC(=O)OC1C2OC(=O)CN1CCOCC1

nearest known ligand 0.34

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
POLB P06746 1/20 0.34
ALDH1A1 P00352 4/20 0.32
KDM4E B2RXH2 3/20 0.31
HSD17B10 Q99714 2/20 0.31
ALOX15 P16050 1/20 0.31
TSHR P16473 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
NPC1 O15118 1/20 0.30
GAA P10253 1/20 0.30
HTT P42858 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13081846 0.80 PRKCA (0.30)
SCHEMBL1704827 0.73 ALDH1A1 (0.31) ALDH1A1
SCHEMBL10282093 0.72 HMGCR (0.37) MEN1KMT2AALDH1A1KDM4EALOX15
SCHEMBL12014661 0.72 HSD17B10 (0.32) MEN1KMT2APOLBALDH1A1KDM4E
SCHEMBL12014377 0.70 CHRM2 (0.35) MEN1KMT2APOLBALDH1A1KDM4E
SCHEMBL13146123 0.70 SMN1; SMN2 (0.31) SMN1; SMN2
SCHEMBL13966285 0.70
SCHEMBL24177768 0.66 SMN1; SMN2 (0.35) MEN1KMT2APOLBALDH1A1KDM4E
SCHEMBL26147228 0.66 SMN1; SMN2 (0.35) MEN1KMT2APOLBALDH1A1KDM4E
SCHEMBL9947154 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130022909-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-01-24 US disclosed
US-20120219899-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-08-30 US disclosed