Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12015727 | 0.91 | — | — | |
| SCHEMBL328506 | 0.88 | KDM4E (0.31) | — | |
| SCHEMBL12998836 | 0.85 | TSHR (0.32) | — | |
| SCHEMBL686553 | 0.84 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL786553 | 0.83 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL16858287 | 0.81 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL13081846 | 0.79 | PRKCA (0.30) | — | |
| SCHEMBL13082173 | 0.79 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL13012065 | 0.79 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL16858290 | 0.78 | ALDH1A1 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8304164-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20120171618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-8003296-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-23 | — | — | US | disclosed |
| US-20110117494-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20110117495-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100062365-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (11 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120052440-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | C1S, C1R, CLIC1 | ALDH1A1 3659/4885 |
| US-20110059400-A1 | PHOTORESIST COMPOSITION | C1R, C1S, CCNT1 | ALDH1A1 2162/4885 |
| US-20110065047-A1 | PHOTORESIST COMPOSITION | C1R, C1S, RER1 | ALDH1A1 1016/4885 |
| US-20100297555-A1 | MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION | DCXR, RPS10, RRS1 | ALDH1A1 923/4885 |
| US-20110117495-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, C1R | ALDH1A1 4075/4885 |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | ALDH1A1 706/4885 |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | RER1, FGFR1, NHERF1 | ALDH1A1 1649/4885 |
| US-20110117494-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, C1R, AFF1 | ALDH1A1 4110/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | ALDH1A1 2064/4885 |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | H1-0, H1-2, H1-3 | ALDH1A1 1807/4885 |
| US-20120088190-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | AFF1, FGFR1, FRG1 | ALDH1A1 2566/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.