SCHEMBL12016502

SCHEMBL12016502

CCCCN(CCCC)c1ccc(OC=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 1/20 0.41
ERBB2 P04626 1/20 0.41
CNR2 P34972 2/20 0.41
ALDH1A1 P00352 3/20 0.39
ALDH3A1 P30838 1/20 0.39
ALDH1A3 P47895 1/20 0.39
AR P10275 2/20 0.39
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38
CHRM5 P08912 1/20 0.38
CHRM1 P11229 1/20 0.38
CHRM3 P20309 1/20 0.38
SLC16A3 O15427 1/20 0.37
SLC16A1 P53985 1/20 0.37
KDM4E B2RXH2 3/20 0.36
POLB P06746 1/20 0.36
GAA P10253 1/20 0.36
NR1H2 P55055 1/20 0.36
NR1H3 Q13133 1/20 0.36
MAPT P10636 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24359635 0.95 CNR2 (0.40) EGFRERBB2CNR2ALDH1A1ALDH3A1
SCHEMBL194428 0.82 ALDH1A1 (0.59) CNR2ALDH1A1ALDH3A1ALDH1A3KDM4E
SCHEMBL7153351 0.79 EGFR (0.50) EGFRERBB2CNR2ALDH1A1ALDH3A1
SCHEMBL13568699 0.78 PTGES (0.51) ALDH1A1KDM4ESMN1; SMN2PTGES
SCHEMBL1573445 0.78 CNR2 (0.47) EGFRERBB2CNR2ALDH1A1SLC16A3
SCHEMBL7187972 0.77 NQO1 (0.54) ALDH1A1KDM4EPOLBMAPTNPC1
SCHEMBL420424 0.77 ALDH1A1 (0.68) EGFRERBB2CNR2ALDH1A1ALDH3A1
SCHEMBL2096678 0.76 LTA4H (0.52) ALDH1A1MAPTHPGDSMN1; SMN2
SCHEMBL10612062 0.75 ALDH1A1 (0.66) EGFRERBB2CNR2ALDH1A1ALDH3A1
SCHEMBL2014159 0.75 EGFR (0.47) EGFRERBB2CNR2ALDH1A1AR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE46765-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-27 US disclosed
US-RE46736-E1 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-27 US disclosed
US-9182670-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-10 US disclosed
US-8951710-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-20140342274-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed
US-20140329183-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-06 US disclosed
US-8835096-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-16 US disclosed
US-8815491-B2 Chemically amplified negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-26 US disclosed
US-20120219887-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-30 US disclosed