SCHEMBL12019082

SCHEMBL12019082

O=C(OC(C(F)F)C(F)(F)F)C1C2CC3CC(C2)CC1C3

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12256211 0.77 LMNA (0.35)
SCHEMBL12018134 0.77 HSD11B1 (0.31) HSD11B1
SCHEMBL12256213 0.76 POLB (0.39) HSD11B1
SCHEMBL13833053 0.76 MEN1 (0.40)
SCHEMBL6367604 0.75 EPHX2 (0.33) HSD11B1
SCHEMBL384177 0.74
SCHEMBL11991781 0.72 ALDH1A1 (0.37)
SCHEMBL10135263 0.72
SCHEMBL11953036 0.72
SCHEMBL11991780 0.71 FABP7 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2492747-A2 Chemically amplified negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-08-29 EP disclosed
EP-2101217-A1 Sulfonium salt-containing polymer, resist compositon, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-16 EP disclosed