Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGLN1 | Q9GZT9 | 3/20 | 0.36 |
| ▸ | KDM6B | O15054 | 1/20 | 0.36 |
| ▸ | KDM5C | P41229 | 1/20 | 0.36 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.36 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.36 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.36 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.30 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12017971 | 0.82 | TSHR (0.50) | LMNA | |
| SCHEMBL17376887 | 0.82 | EGLN1 (0.36) | EGLN1KDM6BKDM5CPHF8KDM2A | |
| SCHEMBL19138735 | 0.79 | KDM6B (0.34) | EGLN1KDM6BKDM5CPHF8KDM2A | |
| SCHEMBL13446169 | 0.77 | LMNA (0.32) | LMNAMAPK1 | |
| SCHEMBL28910045 | 0.77 | LMNA (0.41) | EGLN1KDM6BKDM5CPHF8KDM2A | |
| SCHEMBL15671203 | 0.76 | EGLN1 (0.41) | EGLN1KDM6BKDM5CPHF8KDM2A | |
| SCHEMBL17199314 | 0.75 | — | — | |
| SCHEMBL13446323 | 0.75 | — | — | |
| SCHEMBL12019085 | 0.74 | LMNA (0.58) | LMNAMAPK1 | |
| SCHEMBL12657983 | 0.73 | EGLN1 (0.34) | EGLN1KDM6BKDM5CPHF8KDM2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120288796-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| EP-2492747-A2 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-08-29 | — | — | EP | disclosed |
| EP-2101217-A1 | Sulfonium salt-containing polymer, resist compositon, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-16 | — | — | EP | disclosed |
| US-7527912-B2 | Photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | RER1, SCO2, ASIC3 | EGLN1 1143/4885KDM6B 2957/4885KDM5C 3677/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.