SCHEMBL12058542

SCHEMBL12058542

CC(C)(C)CC(C)(C(=O)Oc1cccc(O)c1)C(C)(C)C

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ CYP3A4 P08684 1/20 0.54
▸ ESR1 P03372 2/20 0.46
▸ ESR2 Q92731 2/20 0.46
▸ POLB P06746 1/20 0.42
▸ MEN1 O00255 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ EGFR P00533 1/20 0.39
▸ CHRNB2 P17787 1/20 0.39
▸ CHRNA4 P43681 1/20 0.39
▸ CASP3 P42574 1/20 0.37
▸ SENP8 Q96LD8 1/20 0.37
▸ SENP7 Q9BQF6 1/20 0.37
▸ SENP6 Q9GZR1 1/20 0.37
▸ CNR1 P21554 1/20 0.36
▸ CNR2 P34972 1/20 0.36
▸ ELANE P08246 1/20 0.36
▸ LMNA P02545 1/20 0.36
▸ APP P05067 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24405188 0.85 ELANE (0.40) CYP3A4ESR1POLBMEN1KMT2A
SCHEMBL12058674 0.84 ELANE (0.51) ESR1MEN1KMT2AELANELMNA
SCHEMBL10250059 0.84 ELANE (0.46) POLBMEN1KMT2AELANE
SCHEMBL25515127 0.81 MAOB (0.42) EGFRELANELMNAAPP
SCHEMBL21776384 0.80 NR1H3 (0.39) LMNA
SCHEMBL23762903 0.79 ATM (0.40) ESR1ESR2POLBELANE
SCHEMBL12338987 0.79 CYP3A4 (0.62) CYP3A4ESR1ESR2POLBMEN1
SCHEMBL18791204 0.79 CYP3A4 (0.67) CYP3A4ESR1ESR2POLBELANE
SCHEMBL25068834 0.78 ATM (0.53) POLBLMNA
SCHEMBL25524624 0.78 CA1 (0.35) CYP3A4POLBMEN1KMT2AELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681220-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 — — US disclosed
US-20190196328-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2019-06-27 — — US disclosed
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11681220-B2 Resist composition and method for producing resist pattern RER1, POLR1A, REV1 CYP3A4 3520/4885ESR1 479/4885ESR2 1741/4885
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME RIF1, MSI2, SLIRP CYP3A4 4388/4885ESR1 544/4885ESR2 872/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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