SCHEMBL23762903

SCHEMBL23762903

Cc1cc(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)ccc1O

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ATM Q13315 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ GAA P10253 1/20 0.40
▸ XBP1 P17861 1/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.40
▸ ESR1 P03372 5/20 0.38
▸ NR1H4 Q96RI1 4/20 0.37
▸ ELANE P08246 4/20 0.36
▸ POLB P06746 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ ESR2 Q92731 3/20 0.36
▸ AR P10275 1/20 0.36
▸ NPC1 O15118 1/20 0.35
▸ TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24405188 0.88 ELANE (0.40) ATML3MBTL1GAAXBP1NPSR1
SCHEMBL25068834 0.87 ATM (0.53) ATML3MBTL1GAAXBP1NPSR1
SCHEMBL14477140 0.84 ESR1 (0.36) ESR1ELANEPOLBESR2
SCHEMBL12058674 0.82 ELANE (0.51) ESR1ELANE
SCHEMBL19558305 0.80 ELANE (0.56) ESR1ELANE
SCHEMBL12058542 0.79 CYP3A4 (0.54) ESR1ELANEPOLBESR2
SCHEMBL24405004 0.79 ELANE (0.40) ATML3MBTL1GAAXBP1NPSR1
SCHEMBL25515127 0.78 MAOB (0.42) ELANEMAPT
SCHEMBL15395815 0.78 ESR1 (0.46) ATML3MBTL1GAAXBP1NPSR1
SCHEMBL25068947 0.77 ELANE (0.45) GAAELANETDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681220-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 — — US disclosed
US-20230152693-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-18 — — US disclosed
US-20210255545-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-08-19 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11681220-B2 Resist composition and method for producing resist pattern RER1, POLR1A, REV1 ATM 2738/4885L3MBTL1 1715/4885GAA 2054/4885
US-20210255545-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN FGFR1, RER1, FGF1 ATM 3407/4885L3MBTL1 1095/4885GAA 4858/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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