SCHEMBL12134641

SCHEMBL12134641

COc1cc(C(C)(C)c2cc(C(C)(C)c3cc(CO)c(O)c(CO)c3)cc(C(C)(C)c3cc(CO)c(O)c(OC)c3)c2)cc(CO)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.46
KLF10 Q13118 1/20 0.46
MAPK1 P28482 1/20 0.46
HTT P42858 1/20 0.46
PDE4A P27815 1/20 0.42
PDE4B Q07343 1/20 0.42
PDE4C Q08493 1/20 0.42
PDE4D Q08499 1/20 0.42
ALOX5 P09917 5/20 0.37
PTGS2 P35354 4/20 0.36
ALDH1A1 P00352 1/20 0.36
CYP3A4 P08684 1/20 0.36
HPGD P15428 1/20 0.36
TSHR P16473 1/20 0.36
ALOX12 P18054 1/20 0.36
CASP1 P29466 1/20 0.36
RECQL P46063 1/20 0.36
HIF1A Q16665 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10130971 0.98 ALOX15 (0.47) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL10064214 0.95 ALOX15 (0.47) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL13378284 0.93 ALOX15 (0.41) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL12203702 0.93 ALOX15 (0.41) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL15944058 0.88 KLF10 (0.46) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL17281709 0.87 SHBG (0.45) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL12133569 0.87 KLF10 (0.45) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL10130844 0.87 PDE4A (0.42) ALOX15KLF10MAPK1HTTPDE4A
SCHEMBL10130843 0.86 CYP2C19 (0.44) ALOX15KLF10PDE4APDE4BPDE4C
SCHEMBL14028985 0.86 ALOX15 (0.59) ALOX15KLF10MAPK1HTTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110287234-A1 NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN FUJIFILM CORPORATION (JP) 2011-11-24 US disclosed
WO-2010087516-A1 NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN FUJIFILM CORPORATION (JP) 2010-08-05 WO disclosed
US-20080241745-A1 Mixture of alkali soluble polymer, crosslinking agent, acid generator ; radiation with actinic radiation; quaternary ammonium compound FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed