Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 3/20 | 0.59 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.59 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.46 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | CASP1 | P29466 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.44 |
| ▸ | SHBG | P04278 | 1/20 | 0.41 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.39 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.39 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.39 |
| ▸ | RET | P07949 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26134510 | 0.98 | ALOX15 (0.61) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL224429 | 0.98 | ALOX15 (0.61) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL10051856 | 0.90 | KLF10 (0.59) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL12285444 | 0.90 | ALOX15 (0.53) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL25446794 | 0.88 | ALOX15 (0.52) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL21096823 | 0.88 | ALOX15 (0.52) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL836696 | 0.87 | SHBG (0.57) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL4852210 | 0.86 | KLF10 (0.55) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL8733565 | 0.86 | KLF10 (0.59) | ALOX15KLF10MAPK1HTTHIF1A | |
| SCHEMBL12134641 | 0.86 | ALOX15 (0.46) | ALOX15KLF10MAPK1HTTHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-9034560-B2 | Negative resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20140227642-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8637222-B2 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20080241745-A1 | Mixture of alkali soluble polymer, crosslinking agent, acid generator ; radiation with actinic radiation; quaternary ammonium compound | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |