SCHEMBL12149604

SCHEMBL12149604

O=C(O)C1C2C=CC(C2)C1C(=O)OCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.55

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.55
POLB P06746 2/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
LMNA P02545 1/20 0.48
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
HTT P42858 1/20 0.39
APEX1 P27695 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
TAAR1 Q96RJ0 1/20 0.35
EPHX2 P34913 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12149652 0.87 ALDH1A1 (0.49) ALDH1A1POLBSMN1; SMN2LMNAMEN1
SCHEMBL12149623 0.81 ALDH1A1 (0.38) ALDH1A1POLBSMN1; SMN2LMNAMEN1
SCHEMBL12151828 0.79 ALDH1A1 (0.36) ALDH1A1POLBSMN1; SMN2LMNAMEN1
SCHEMBL7908352 0.77 ALDH1A1 (0.68) ALDH1A1POLBSMN1; SMN2LMNAHTT
SCHEMBL31248314 0.77 POLB (0.48) ALDH1A1POLBSMN1; SMN2LMNAAPEX1
SCHEMBL19911088 0.75 ALDH1A1 (0.37) ALDH1A1POLBSMN1; SMN2LMNAMEN1
SCHEMBL7594331 0.74 POLB (0.69) ALDH1A1POLBSMN1; SMN2LMNAHTT
SCHEMBL19318637 0.74 POLB (0.69) ALDH1A1POLBSMN1; SMN2LMNAHTT
SCHEMBL19318634 0.74 POLB (0.69) ALDH1A1POLBSMN1; SMN2LMNAHTT
SCHEMBL7911629 0.74 ALDH1A1 (0.64) ALDH1A1POLBSMN1; SMN2LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8932795-B2 Resist composition, method of forming resist pattern, novel compound, and acid generator TOKYO OHKA KOGYO CO., LTD. (JP) 2015-01-13 US disclosed
US-8932795-B2 Resist composition, method of forming resist pattern, novel compound, and acid generator TOKYO OHKA KOGYO CO., LTD. (JP) 2015-01-13 US disclosed
US-20110287362-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR TOKYO OHKA KOGYO CO., LTD. (JP) 2011-11-24 US disclosed
US-20110287362-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR TOKYO OHKA KOGYO CO., LTD. (JP) 2011-11-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110287362-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR RER1, ASIC1, SCO2 ALDH1A1 1932/4885POLB 525/4885SMN1; SMN2 1237/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.