Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13219576 | 0.85 | EPHX1 (0.32) | EPHX1 | |
| SCHEMBL12202164 | 0.83 | EPHX1 (0.31) | EPHX1 | |
| SCHEMBL13219579 | 0.83 | EPHX1 (0.40) | EPHX1CYP19A1HTTSMN1; SMN2 | |
| SCHEMBL17052466 | 0.83 | MLNR (0.32) | EPHX1CYP19A1 | |
| SCHEMBL3434648 | 0.82 | EPHX1 (0.37) | EPHX1CYP19A1KDM4EHTTSMN1; SMN2 | |
| SCHEMBL2601704 | 0.82 | CA2 (0.42) | CYP19A1 | |
| SCHEMBL12202178 | 0.79 | EPHX1 (0.31) | EPHX1 | |
| SCHEMBL12202162 | 0.79 | — | — | |
| SCHEMBL9925207 | 0.78 | EPHX1 (0.41) | EPHX1CYP19A1KDM4EHTTSMN1; SMN2 | |
| SCHEMBL131561 | 0.77 | EPHX1 (0.50) | EPHX1CYP19A1KDM4EHTTSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9250531-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-8735045-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8450044-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-8034536-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20110111343-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110097667-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20090297980-A1 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2009-12-03 | — | — | US | disclosed |