SCHEMBL12228667

SCHEMBL12228667

C=C(OOC(C)(C)C)Oc1ccc([S+](c2ccc(OCC(=O)OC(C)(C)C)cc2)c2ccc(OCC(=O)OC(C)(C)C)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PSEN1 P49768 3/20 0.38
▸ PSEN2 P49810 3/20 0.38
▸ APH1B Q8WW43 3/20 0.38
▸ NCSTN Q92542 3/20 0.38
▸ APH1A Q96BI3 3/20 0.38
▸ PSENEN Q9NZ42 3/20 0.38
▸ PTPN1 P18031 3/20 0.38
▸ GAA P10253 2/20 0.36
▸ LMNA P02545 2/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ NPC1 O15118 2/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ L3MBTL1 Q9Y468 3/20 0.35
▸ CNR1 P21554 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ ELANE P08246 1/20 0.33
▸ MAPT P10636 2/20 0.33
▸ POLB P06746 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13005265 0.96 PTPN1 (0.41) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL13098233 0.86 PSEN1 (0.38) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL383065 0.84 PSEN1 (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL13098203 0.82 PTPN1 (0.44) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL133377 0.79 PTPN1 (0.51) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8323320 0.79 PTPN1 (0.51) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL8320132 0.78 PSEN1 (0.48) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL12533833 0.77 MAPT (0.40) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL10175752 0.77 ELANE (0.47) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL7602827 0.76 MAPT (0.44) PSEN1PSEN2APH1BNCSTNAPH1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8043786-B2 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions JSR CORPORATION (JP) 2011-10-25 — — US disclosed
US-8026039-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2011-09-27 — — US disclosed
US-20100255420-A1 RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER JSR CORPORATION (JP) 2010-10-07 — — US disclosed
US-20100040977-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-18 — — US disclosed
US-20070054214-A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions JSR CORPORATION (JP) 2007-03-08 — — US disclosed
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