Fluoride

Fluoride

SCHEMBL122407

COc1ccc([S+](c2ccc(OC)cc2)c2ccc(OC)cc2)cc1.F.F.F.F.F.[AsH3].[F-]

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.55
CA2 P00918 2/20 0.55
CA7 P43166 2/20 0.55
CA9 Q16790 2/20 0.55
CA12 O43570 1/20 0.55
CA14 Q9ULX7 1/20 0.55
ACHE P22303 1/20 0.46
NOS3 P29474 2/20 0.45
TDP1 Q9NUW8 3/20 0.44
MAPK1 P28482 2/20 0.44
ALDH1A1 P00352 3/20 0.42
KDM4E B2RXH2 1/20 0.42
NPC1 O15118 1/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
THRB P10828 1/20 0.42
RECQL P46063 1/20 0.42
RAB9A P51151 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL122408 0.97 CA1 (0.58) CA1CA2CA7CA9CA12
SCHEMBL372869 0.92 CA1 (0.65) CA1CA2CA7CA9CA12
Hydrochloric Acid SCHEMBL11132722 0.90 CA1 (0.61) CA1CA2CA7CA9CA12
Iodide SCHEMBL10951556 0.90 CA1 (0.61) CA1CA2CA7CA9CA12
SCHEMBL4340775 0.83 CA4 (0.59) CA1CA2CA7CA9CA12
SCHEMBL12216246 0.83 ACHE (0.71) CA1CA2CA7CA9CA12
SCHEMBL3872273 0.83 ACHE (0.71) CA1CA2CA7CA9CA12
SCHEMBL31495990 0.83 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL1477263 0.83 CA1 (0.52) CA1CA2CA7CA9CA12
SCHEMBL47490 0.83 CA4 (0.59) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024122416-A1 METHOD FOR PRODUCING LAMINATED BODY WITH HARD COAT LAYER 東亞合成株式会社 2024-06-13 WO disclosed
US-20240158904-A1 UNDERCOAT AGENT COMPOSITION FOR LAYERING INORGANIC MATERIAL LAYER, CURED PRODUCT THEREOF AND PRODUCTION METHOD THEREOF TOAGOSEI CO., LTD. (JP) 2024-05-16 US disclosed
WO-2023238836-A1 SILSESQUIOXANE DERIVATIVE AND METHOD FOR PRODUCING SAME, CURABLE COMPOSITION, HARD COAT AGENT, CURED PRODUCT, HARD COAT, AND BASE MATERIAL 東亞合成株式会社 2023-12-14 WO disclosed
EP-4289618-A1 UNDERCOAT AGENT COMPOSITION FOR INORGANIC SUBSTANCE LAYER LAMINATION, CURED PRODUCT THEREOF, AND METHOD FOR PRODUCING SAME Toagosei Co., Ltd. (JP) 2023-12-13 EP disclosed
US-20220186066-A1 PROTECTION MEMBER FOR SEMICONDUCTOR, PROTECTION COMPOSITION FOR INKJET COATING-TYPE SEMICONDUCTOR, AND METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS USING SAME, AND SEMICONDUCTOR APPARATUS MITSUI CHEMICALS, INC. (JP) 2022-06-16 US disclosed
US-11295999-B2 Composition for encapsulating organic electronic element LG CHEM, LTD. (KR) 2022-04-05 US disclosed
US-20200127206-A1 COMPOSITION FOR ENCAPSULATING ORGANIC ELECTRONIC ELEMENT LG CHEM, LTD. (KR) 2020-04-23 US disclosed
EP-3613789-A1 COMPOSITION FOR SEALING ORGANIC ELECTRONIC ELEMENT LG Chem, Ltd. (KR) 2020-02-26 EP disclosed
US-9136486-B2 Composition for organic semiconductor insulating films, and organic semiconductor insulating film TOAGOSEI CO., LTD. (JP) 2015-09-15 US disclosed
US-8987344-B2 Hardcoat composition MITSUI CHEMICALS, INC. (JP) 2015-03-24 US disclosed
US-20100029804-A1 HARDCOAT COMPOSITION MITSUI CHEMICALS, INC (JP) 2010-02-04 US disclosed
EP-1791824-B1 RADICALLY POLYMERIZABLE SULFUR-CONTAINING COMPOUND AND RADICALLY POLYMERIZABLE SULFUR-CONTAINING POLYMER SHOWA DENKO KK (JP) 2009-08-05 EP disclosed
US-20090192279-A1 Radically Polymerizable Sulfur-Containing Compound and Radically Polymerizable Sulfur-Containing Polymer SHOWA DENKO K.K. (JP) 2009-07-30 US disclosed
US-7518001-B2 Radically polymerizable sulfur-containing compound and radically polymerizable sulfur-containing polymer SHOWA DENKO K.K. (JP) 2009-04-14 US disclosed
US-20070208149-A1 Radically Polymerizable Sulfur-Containing Compound And Radically Polymerizable Sulfur-Containing Polymer SHOWA DENKO K.K. (JP) 2007-09-06 US disclosed
US-20070037896-A1 polymerizable resin composition comprises an epoxy compound, a photo cation polymerization initiator, and a photo radical polymerization initiator; excellent in curing properties and corrosion resistance with less resin coloration and less cure shrinkage; surface protective material for optical disks MITSUI CHEMICALS, INC. (JP) 2007-02-15 US disclosed
EP-1630189-A1 CATIONICALLY PHOTOPOLYMERIZABLE RESIN COMPOSITION AND OPTICAL DISK SURFACE PROTECTION MATERIAL Mitsui Chemicals, Inc. (JP) 2006-03-01 EP disclosed
US-6395340-B1 THERMOSETTING PAINT KANSAI PAINT CO., LTD. (JP) 2002-05-28 US disclosed
EP-1038935-A1 COATING COMPOSITION AND METHOD FOR COATING THEREWITH KANSAI PAINT CO., LTD. (JP) 2000-09-27 EP disclosed
EP-1026211-A1 COATING COMPOSITION AND METHOD FOR APPLYING THE SAME KANSAI PAINT CO., LTD. (JP) 2000-08-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070208149-A1 Radically Polymerizable Sulfur-Containing Compound And Radically Polymerizable Sulfur-Containing Polymer CBS, TST, MSRB3 CA1 769/4885CA2 1571/4885CA7 1546/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.