SCHEMBL12256286

SCHEMBL12256286

O=S(=O)(C(F)F)N1CCCC2CCCCC21

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.38
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CNR2 P34972 1/20 0.32
TRPA1 O75762 1/20 0.31
CCNE1 P24864 2/20 0.31
CDK2 P24941 2/20 0.31
NAMPT P43490 1/20 0.31
POLB P06746 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
DPP7 Q9UHL4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18572483 0.75 MAPT (0.37) MAPTPOLB
SCHEMBL12418314 0.75 MAPT (0.43) MAPTNPC1RAB9ASMN1; SMN2CNR2
SCHEMBL18572481 0.72 MAPT (0.35) MAPT
SCHEMBL12256401 0.71 MAPT (0.36) MAPTCNR2POLB
SCHEMBL13713664 0.70 MAPT (0.30) MAPT
SCHEMBL9609290 0.69 MAPT (0.35) MAPTNPC1RAB9ASMN1; SMN2NAMPT
SCHEMBL18627855 0.68 MAPT (0.35) MAPTNPC1RAB9ASMN1; SMN2NAMPT
SCHEMBL13266807 0.68 MAPT (0.34) MAPTNPC1RAB9ASMN1; SMN2TRPA1
SCHEMBL9609349 0.68 MAPT (0.34) MAPTNPC1RAB9ASMN1; SMN2CNR2
SCHEMBL9608600 0.68 MAPT (0.36) MAPTNPC1RAB9ASMN1; SMN2CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170059992-A1 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-03-02 US disclosed
US-8709704-B2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method FUJIFILM CORPORATION (JP) 2014-04-29 US disclosed
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD RER1, RARA, RARG MAPT 2149/4885NPC1 4066/4885RAB9A 2230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.