SCHEMBL9608600

SCHEMBL9608600

O=S(=O)(O)CS(=O)(=O)N1CCCC2CCCCC21

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.36
NAMPT P43490 1/20 0.34
ALDH1A1 P00352 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2C9 P11712 1/20 0.32
TP53 P04637 1/20 0.32
TSHR P16473 1/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MMP1 P03956 1/20 0.31
MMP7 P09237 1/20 0.31
MMP8 P22894 1/20 0.31
MMP12 P39900 1/20 0.31
MMP13 P45452 1/20 0.31
CNR2 P34972 1/20 0.30
DRD2 P14416 1/20 0.30
DRD4 P21917 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9608592 0.85 MAPT (0.36) MAPTNAMPTMMP1MMP7MMP8
SCHEMBL12418314 0.80 MAPT (0.43) MAPTNAMPTNPC1RAB9ASMN1; SMN2
SCHEMBL794330 0.78 NPC1 (0.37) MAPTNAMPTALDH1A1NPC1RAB9A
SCHEMBL770325 0.76 MMP8 (0.39) MAPTNAMPTNPC1RAB9ASMN1; SMN2
SCHEMBL4350050 0.74 TSHR (0.38) MAPTALDH1A1CYP1A2CYP3A4CYP2C9
SCHEMBL770853 0.73 MMP8 (0.38) MAPTALDH1A1CYP1A2NPC1RAB9A
SCHEMBL770346 0.71 MMP8 (0.40) ALDH1A1CYP1A2CYP3A4CYP2C9TSHR
SCHEMBL770784 0.70 DRD2 (0.40) NPC1RAB9ASMN1; SMN2CNR2DRD2
SCHEMBL9608599 0.70 HSD11B1 (0.37) NAMPTTSHRCNR2DRD2
SCHEMBL9609290 0.70 MAPT (0.35) MAPTNAMPTNPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120135348-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-05-31 US disclosed