SCHEMBL12376831

SCHEMBL12376831

CC(OC(=O)c1ccc2c(c1)CCC2)C(F)(F)S(=O)(=O)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.45
MEN1 O00255 4/20 0.45
ALDH1A1 P00352 6/20 0.43
TRPV1 Q8NER1 1/20 0.41
HTT P42858 1/20 0.39
HSP90AA1 P07900 1/20 0.37
GAA P10253 1/20 0.37
NPC1 O15118 5/20 0.36
RAB9A P51151 5/20 0.36
RXRA P19793 1/20 0.36
RXRB P28702 1/20 0.36
RXRG P48443 1/20 0.36
SRD5A1 P18405 1/20 0.36
SMN1; SMN2 Q16637 4/20 0.36
MAPT P10636 4/20 0.36
KDM4E B2RXH2 2/20 0.36
HPGD P15428 2/20 0.36
LMNA P02545 1/20 0.36
CASP3 P42574 1/20 0.36
SENP8 Q96LD8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12410739 0.84 MEN1 (0.46) KMT2AMEN1ALDH1A1TRPV1HTT
SCHEMBL12376834 0.82 KMT2A (0.51) KMT2AMEN1ALDH1A1TRPV1HTT
SCHEMBL27724166 0.78 ALDH1A1 (0.56) KMT2AMEN1ALDH1A1TRPV1HTT
SCHEMBL22694210 0.77 CA12 (0.56) KMT2AMEN1ALDH1A1SMN1; SMN2LMNA
SCHEMBL13178127 0.77 MAPT (0.41) KMT2AALDH1A1HTTNPC1RAB9A
SCHEMBL7602480 0.77 GABBR2 (0.43) KMT2AMEN1ALDH1A1HSP90AA1GAA
SCHEMBL22694208 0.77 CA12 (0.46) HSP90AA1KDM4ELMNACA12CA1
SCHEMBL22694214 0.76 SERPINE1 (0.45) GAAKDM4ELMNANFKB1NFKB2
SCHEMBL26063430 0.76 LMNA (0.41) ALDH1A1NPC1RAB9AMAPTLMNA
SCHEMBL26059443 0.76 CA1 (0.39) ALDH1A1TRPV1HTTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X KMT2A 1677/4885MEN1 4079/4885ALDH1A1 4540/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.