Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A1 | P30531 | 1/20 | 0.35 |
| ▸ | SLC6A12 | P48065 | 1/20 | 0.35 |
| ▸ | SLC6A11 | P48066 | 1/20 | 0.35 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.32 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11217697 | 0.86 | SLC6A1 (0.35) | SLC6A1SLC6A12SLC6A11PLA2G1BATG4B | |
| SCHEMBL1823706 | 0.80 | SLC6A1 (0.34) | SLC6A1SLC6A12SLC6A11PLA2G1BATG4B | |
| SCHEMBL4952209 | 0.78 | PLA2G1B (0.31) | SLC6A1SLC6A12SLC6A11PLA2G1BATG4B | |
| SCHEMBL28275006 | 0.77 | SLC6A1 (0.33) | SLC6A1SLC6A12SLC6A11PLA2G1BATG4B | |
| SCHEMBL11965869 | 0.77 | L3MBTL1 (0.37) | SLC6A1SLC6A12SLC6A11PLA2G1BATG4B | |
| SCHEMBL13697534 | 0.74 | SLC6A1 (0.34) | SLC6A1SLC6A12SLC6A11 | |
| SCHEMBL13925836 | 0.73 | SLC6A1 (0.34) | SLC6A1SLC6A12SLC6A11 | |
| SCHEMBL11945909 | 0.73 | L3MBTL1 (0.32) | — | |
| SCHEMBL2740745 | 0.72 | L3MBTL1 (0.31) | SLC6A1SLC6A12SLC6A11 | |
| SCHEMBL2740744 | 0.72 | L3MBTL1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8835092-B2 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8835092-B2 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| US-7666571-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7666571-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7550545-B2 | Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | disclosed |
| US-7550545-B2 | Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | disclosed |
| US-7498393-B2 | Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7498393-B2 | Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1772468-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION | Asahi Glass Company, Limited (JP) | 2007-04-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090221845-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | SLC6A1 4083/4885SLC6A12 4450/4885SLC6A11 4425/4885 |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | PARG, TOP2A, FRG1 | SLC6A1 2426/4885SLC6A12 865/4885SLC6A11 1563/4885 |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | AFF1, AFF4, AFF2 | SLC6A1 2873/4885SLC6A12 4521/4885SLC6A11 3611/4885 |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | SLC6A1 4083/4885SLC6A12 4450/4885SLC6A11 4425/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.