Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 3/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | MDH1 | P40925 | 1/20 | 0.32 |
| ▸ | MDH2 | P40926 | 1/20 | 0.32 |
| ▸ | ABL1 | P00519 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13995725 | 0.88 | DPP4 (0.31) | DPP4 | |
| SCHEMBL14557132 | 0.87 | HSD11B1 (0.34) | DPP4HSD11B1L3MBTL1ALDH1A1NPSR1 | |
| SCHEMBL12134118 | 0.87 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL111708 | 0.86 | ALDH1A1 (0.38) | L3MBTL1ALDH1A1 | |
| SCHEMBL2734498 | 0.85 | ALDH1A1 (0.39) | L3MBTL1ALDH1A1NPSR1TSHRPKM | |
| SCHEMBL14010932 | 0.84 | ALDH1A1 (0.34) | DPP4HSD11B1L3MBTL1ALDH1A1NPSR1 | |
| SCHEMBL13115388 | 0.79 | PKM (0.37) | DPP4HSD11B1ALDH1A1NPSR1MDH1 | |
| SCHEMBL9945803 | 0.78 | HSD11B1 (0.36) | DPP4HSD11B1ALDH1A1NPSR1MDH1 | |
| SCHEMBL15268357 | 0.78 | HSD11B1 (0.36) | DPP4HSD11B1ALDH1A1MDH1MDH2 | |
| SCHEMBL9924478 | 0.77 | ALDH1A1 (0.42) | DPP4HSD11B1L3MBTL1ALDH1A1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7255971-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-08-14 | — | — | US | disclosed |
| US-7255971-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-08-14 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20070141513-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-06-21 | — | — | US | disclosed |
| US-7163781-B2 | Process for producing a semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-01-16 | — | — | US | disclosed |