SCHEMBL12459489

SCHEMBL12459489

CC(C)OCCN1C(=O)CCC1=O

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
POLB P06746 3/20 0.41
HSD17B10 Q99714 2/20 0.39
TSHR P16473 1/20 0.39
HTT P42858 2/20 0.39
HPGD P15428 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
FGF2 P09038 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
FAAH O00519 1/20 0.35
MGLL Q99685 1/20 0.35
OPRM1 P35372 1/20 0.34
MPO P05164 1/20 0.34
GAA P10253 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA4 P22748 1/20 0.32
CA9 Q16790 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26684109 0.92 POLB (0.44) ALDH1A1POLBHSD17B10TSHRHTT
SCHEMBL24790408 0.84 POLB (0.42) ALDH1A1POLBHTTHPGDSMN1; SMN2
SCHEMBL10159565 0.80 HSD17B10 (0.41) ALDH1A1POLBHSD17B10TSHRHTT
SCHEMBL10237827 0.77 PLA2G7 (0.54) ALDH1A1POLBHSD17B10TSHRMEN1
SCHEMBL3629805 0.76 HTT (0.50) ALDH1A1POLBHTTHPGDSMN1; SMN2
SCHEMBL22002013 0.75 MGLL (0.57) ALDH1A1HTTHPGDSMN1; SMN2FAAH
SCHEMBL26329883 0.75 ALDH1A1 (0.46) ALDH1A1POLBHTTHPGDSMN1; SMN2
SCHEMBL15423541 0.74 USP2 (0.34) POLBHSD17B10TSHROPRM1MPO
SCHEMBL25868259 0.73 POLB (0.37) ALDH1A1POLBHSD17B10TSHRHTT
SCHEMBL9917277 0.73 PIK3CD (0.55) ALDH1A1POLBTSHRHTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
WO-2011093520-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-08-04 WO disclosed