Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLA2G10 | O15496 | 1/20 | 0.69 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.69 |
| ▸ | LMNA | P02545 | 1/20 | 0.69 |
| ▸ | SRD5A2 | P31213 | 8/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | HNF4A | P41235 | 1/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4004691 | 0.98 | LMNA (0.67) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL8094666 | 0.95 | ALDH1A1 (0.67) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| Benzophenone SCHEMBL28055726 | 0.93 | ALDH1A1 (0.70) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL585374 | 0.90 | L3MBTL1 (0.59) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL8488480 | 0.90 | SRD5A2 (0.79) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL7811168 | 0.90 | LMNA (0.62) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL25526995 | 0.90 | AKR1C3 (0.59) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL23098254 | 0.88 | ATM (0.61) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL7938446 | 0.87 | LMNA (0.68) | PLA2G10PLA2G2ALMNASRD5A2ALDH1A1 | |
| SCHEMBL13764672 | 0.87 | SRD5A2 (0.77) | PLA2G10PLA2G2ALMNASRD5A2ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6797745-B1 | Hot melt inks containing styrene or terpene polymers | XEROX CORPORATION | 2004-09-28 | — | — | US | claimed |
| US-6461417-B1 | Ink compositions | XEROX CORPORATION | 2002-10-08 | — | — | US | claimed |
| US-4935413-A | ELASTICITY, ADHESION AND DISPERSIBILITY | NIPPON PAINT CO., LTD. (JP) | 1990-06-19 | — | — | US | claimed |
| CN-118027412-A | Photo-alignment material | 罗利克技术有限公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-112375365-A | Preparation method of PC/ABS high-brightness black material with high heat resistance, scratch resistance and high weather resistance for automotive interior | 重庆普利特新材料有限公司 | 2021-02-19 | — | — | CN | disclosed |
| CN-111117095-A | ASA material with high heat resistance, good toughness and high weather resistance for automobile exterior decoration and preparation method thereof | 上海普利特复合材料股份有限公司 | 2020-05-08 | — | — | CN | disclosed |
| CN-103086942-B | Heterocyclic compound and Organic Light Emitting Diode comprising the heterocyclic compound | 三星显示有限公司 | 2019-06-04 | — | — | CN | disclosed |
| CN-108350174-A | Photo-alignment material | 罗利克技术有限公司 | 2018-07-31 | — | — | CN | disclosed |
| CN-102533002-B | Solid ink containing ketone wax and side chain acid amides | Xerox Corp. (US) Patent Dept. 020 Xerox Square 100 Clinton Avenue Rochester New (US) | 2016-01-27 | — | — | CN | disclosed |
| CN-102010410-B | Heterocyclic compound and organic light emitting device including same | SAMSUNG MOBILE DISPLAY CO LTD | 2015-06-17 | — | — | CN | disclosed |
| CN-102010415-B | Heterocyclic compound and organic luminescence display device including the same | SAMSUNG DISPLAY CO LTD | 2015-03-25 | — | — | CN | disclosed |
| US-6461417-B1 | Ink compositions | XEROX CORPORATION | 2002-10-08 | — | — | US | disclosed |
| US-6359028-B1 | USED IN MEDICAL EQUIPMENT, DISCOLORATION INHIBITION | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2002-03-19 | — | — | US | disclosed |
| US-6040367-A | EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2000-03-21 | — | — | US | disclosed |
| US-5977206-A | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5948838-A | 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0794218-A2 | Polycarbonate resin composition stabilized against radiation | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 1997-09-10 | — | — | EP | disclosed |
| EP-0753540-A2 | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0326249-A2 | Polymerizable compositions comprising Mannich bases and diaryliodonium photoinitiators. | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-08-02 | — | — | EP | disclosed |
| US-4791045-A | COATINGS; GRAPHIC ARTS; INCREASED PHOTOSENSITIVITY FOR ADDITION POLYMERIZATION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-12-13 | — | — | US | disclosed |