SCHEMBL1258019

SCHEMBL1258019

O=C1C=CC(=O)N1c1ccc(Cc2ccc(N3C(=O)C=CC3=O)c(N3C(=O)C=CC3=O)c2)cc1N1C(=O)C=CC1=O

nearest known ligand 0.55

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 15/20 0.55
FAAH O00519 4/20 0.55
TLR9 Q9NR96 4/20 0.52
G6PD P11413 1/20 0.41
ALDH1A1 P00352 2/20 0.38
HSP90AA1 P07900 2/20 0.38
ATM Q13315 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
MITF O75030 1/20 0.38
HTT P42858 1/20 0.38
PKM P14618 1/20 0.37
CCR6 P51684 1/20 0.37
TDP1 Q9NUW8 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30279692 1.00 MGLL (0.55) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL2596734 0.91 MGLL (0.72) MGLLFAAHTLR9G6PDHSP90AA1
SCHEMBL13385343 0.84 TLR9 (0.48) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL486535 0.82 MGLL (0.53) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL30272075 0.82 MGLL (0.53) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL29551719 0.82 MGLL (0.53) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL2596747 0.82 MGLL (0.53) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL31264193 0.82 MGLL (0.53) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL30104189 0.81 MGLL (0.59) MGLLFAAHTLR9G6PDALDH1A1
SCHEMBL29929064 0.81 MGLL (0.59) MGLLFAAHTLR9G6PDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024201211-A1 ADHESIVE-ATTACHED METAL SUBSTRATE, AND LAMINATE 藤森工業株式会社 2024-10-03 WO disclosed
US-20230331915-A1 Isocyanate-Modified Polyimide Resin, Resin Composition and Cured Product of Same NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2023-10-19 US disclosed
WO-2023187625-A1 ADHESIVE-ATTACHED METAL SUBSTRATE AND LAMINATE 藤森工業株式会社 2023-10-05 WO disclosed
WO-2023187624-A1 ADHESIVE-EQUIPPED METAL SUBSTRATE AND LAMINATE 藤森工業株式会社 2023-10-05 WO disclosed
US-11608316-B2 Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2023-03-21 US disclosed
CN-115777003-A Isocyanate-modified polyimide resin, resin composition, and cured product thereof 日本化药株式会社 2023-03-10 CN disclosed
US-11414382-B2 Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2022-08-16 US disclosed
US-20220112373-A1 THERMOSETTING RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2022-04-14 US disclosed
CN-109689742-B Curable resin mixture and method for producing curable resin composition 昭和电工株式会社 2021-12-10 CN disclosed
US-20210284783-A1 METHODS FOR PRODUCING CURABLE RESIN MIXTURE AND CURABLE RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2021-09-16 US disclosed
US-20200031973-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND STRUCTURE INCLUDING CURED PRODUCT THEREOF SHOWA DENKO K.K. (JP) 2020-01-30 US disclosed
CN-110546177-A Maleimide resin composition, prepreg and cured product thereof NIPPON KAYAKU KK 2019-12-06 CN disclosed
EP-3239199-B1 THERMOSETTING RESIN COMPOSITION SHOWA DENKO KK (JP) 2019-09-25 EP disclosed
EP-3511363-A1 CURABLE RESIN MIXTURE AND METHOD FOR PRODUCING CURABLE RESIN COMPOSITION Showa Denko K.K. (JP) 2019-07-17 EP disclosed
US-10160856-B2 Thermosetting resin composition SHOWA DENKO K.K. (JP) 2018-12-25 US disclosed
US-20180282494-A1 THERMOSETTING RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2018-10-04 US disclosed
US-20170349743-A1 THERMOSETTING RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2017-12-07 US disclosed
EP-3239199-A1 THERMOSETTING RESIN COMPOSITION Showa Denko K.K. (JP) 2017-11-01 EP disclosed
EP-3239200-A1 THERMOSETTING RESIN COMPOSITION Showa Denko K.K. (JP) 2017-11-01 EP disclosed
US-20110042124-A1 MULTILAYER WIRING SUBSTRATE HAVING CAVITY PORTION MITSUBISHI PLASTICS, INC. (JP) 2011-02-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11414382-B2 Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator RAD51, RER1, REV1 MGLL 4679/4885FAAH 2717/4885TLR9 309/4885
US-11608316-B2 Compound, photopolymerization initiator containing said compound, and photosensitive resin composition containing said photopolymerization initiator RAD51, RER1, TAS1R1 MGLL 4614/4885FAAH 3717/4885TLR9 230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.