Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12587749 | 0.95 | PDK1 (0.31) | KMT2A | |
| SCHEMBL15697293 | 0.87 | — | — | |
| SCHEMBL15697297 | 0.86 | MEN1 (0.35) | MEN1KMT2A | |
| SCHEMBL15697300 | 0.82 | LMNA (0.31) | — | |
| SCHEMBL15697291 | 0.81 | LMNA (0.33) | MEN1KMT2A | |
| SCHEMBL785892 | 0.81 | FKBP1A (0.37) | MEN1KMT2A | |
| SCHEMBL12378376 | 0.81 | MEN1 (0.34) | MEN1KMT2A | |
| SCHEMBL15699350 | 0.81 | MEN1 (0.34) | MEN1KMT2A | |
| SCHEMBL8979439 | 0.80 | MEN1 (0.35) | MEN1KMT2A | |
| SCHEMBL2681282 | 0.80 | EPHX1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310682-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310682-B2 | Positive-type resist composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20140134542-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-05-15 | — | — | US | disclosed |
| US-20140134542-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-05-15 | — | — | US | disclosed |
| US-8377625-B2 | Method for producing a copolymer solution with a uniform concentration for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-02-19 | — | — | US | disclosed |
| US-7960494-B2 | Copolymer for semiconductor lithography and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20100143842-A1 | METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-7579131-B2 | Positive resist composition and method of forming resist pattern using the same | FUJIFILM CORPORATION (JP) | 2009-08-25 | — | — | US | disclosed |