SCHEMBL126186

SCHEMBL126186

C=COc1ccc(C=C)cc1

nearest known ligand 0.58

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
TSHR P16473 2/20 0.43
CHRNB2 P17787 2/20 0.41
CHRNA4 P43681 2/20 0.41
CHRNB4 P30926 1/20 0.41
CHRNA3 P32297 1/20 0.41
CHRNA7 P36544 1/20 0.41
TDP1 Q9NUW8 2/20 0.38
HDAC8 Q9BY41 1/20 0.37
TRPA1 O75762 1/20 0.33
CYP2A6 P11509 1/20 0.31
TP53 P04637 2/20 0.30
LMNA P02545 1/20 0.30
CYP3A4 P08684 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL473606 0.86 CHRNB2 (0.34) ALDH1A1TSHRCHRNB2CHRNA4TP53
SCHEMBL13839987 0.82 ALDH1A1 (0.39) ALDH1A1TSHRCHRNB2CHRNA4CHRNB4
SCHEMBL10329388 0.80 ALDH1A1 (0.54) ALDH1A1CYP2A6LMNAKDM4E
SCHEMBL5139572 0.80 ALDH1A1 (0.52) ALDH1A1TSHRCHRNB2CHRNA4CHRNB4
SCHEMBL11965976 0.78 ESR2 (0.33) ALDH1A1TSHRCHRNB2CHRNA4TP53
SCHEMBL296908 0.78 ALDH1A1 (0.65) ALDH1A1TSHRCHRNB2CHRNA4CHRNB4
SCHEMBL14289128 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTDP1TP53LMNA
SCHEMBL8977000 0.77 ALDH1A1 (0.48) ALDH1A1TSHRCHRNB2CHRNA4CHRNB4
SCHEMBL8977004 0.77 ALDH1A1 (0.48) ALDH1A1TSHRCHRNB2CHRNA4CHRNB4
SCHEMBL2365116 0.77 TRPA1 (0.57) ALDH1A1TSHRCHRNB4CHRNA3CHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112799280-A Application of nitrobenzyl alcohol sulfonate compound as accelerator in photoresist and composition for preparing photoresist 北京科华微电子材料有限公司 2021-05-14 CN claimed
EP-0490589-B1 Styryloxy compounds and polymers thereof LOCTITE IRELAND LTD (IE) 1995-03-08 EP claimed
CN-119775478-A Dispersing resin, coloring composition for color filter, and solid-state imaging element 爱天思株式会社 2025-04-08 CN disclosed
CN-118099173-A Solid-state imaging element, method for manufacturing solid-state imaging element, and electronic device 爱天思株式会社 2024-05-28 CN disclosed
CN-112799280-A Application of nitrobenzyl alcohol sulfonate compound as accelerator in photoresist and composition for preparing photoresist 北京科华微电子材料有限公司 2021-05-14 CN disclosed
CN-107407882-B Photocurable/thermosetting resin composition, cured product thereof, and printed wiring board 太阳控股株式会社 2021-01-26 CN disclosed
EP-3284599-B1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORP (JP) 2019-07-03 EP disclosed
EP-3284599-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME Fujifilm Corporation (JP) 2018-02-21 EP disclosed
EP-2610673-B1 Method for manufacturing lithographic printing plates FUJIFILM CORP (JP) 2016-09-21 EP disclosed
US-9299934-B2 Polymer for organic electroluminescent elements, and organic electroluminescent element using cured product of same NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) 2016-03-29 US disclosed
US-9299934-B2 Polymer for organic electroluminescent elements, and organic electroluminescent element using cured product of same NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) 2016-03-29 US disclosed
JP-2004352875-A INTERLAYER INSULATING FILM-FORMING RESIN COMPOSITION NAMICS CORP 2004-12-16 JP disclosed
EP-1470914-A2 Image forming method and image exposure device FUJI PHOTO FILM CO., LTD. (JP) 2004-10-27 EP disclosed
US-20040187720-A1 Lithographic printing method and printing press FUJIFILM CORPORATION (JP) 2004-09-30 US disclosed
EP-1462249-A2 Lithographic printing method and printing press FUJI PHOTO FILM CO., LTD. (JP) 2004-09-29 EP disclosed
US-6794104-B2 FINE PARTICULATE HYDROPHOBICIZING PRECURSOR AND HYDROPHILIC METALLIZED BINDER POLYMER; IMAGE FORMING LAYER COMPRISING LIGHT-HEAT CONVERTING SUBSTANCE AND MICROCAPSULE ENCAPSULATING HYDROPHOBIC SUBSTANCE FUJI PHOTO FILM CO., LTD. (JP) 2004-09-21 US disclosed
US-20030164105-A1 FINE PARTICULATE HYDROPHOBICIZING PRECURSOR AND HYDROPHILIC METALLIZED BINDER POLYMER; IMAGE FORMING LAYER COMPRISING LIGHT-HEAT CONVERTING SUBSTANCE AND MICROCAPSULE ENCAPSULATING HYDROPHOBIC SUBSTANCE FUJI PHOTO FILM CO., LTD. 2003-09-04 US disclosed
EP-1338435-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2003-08-27 EP disclosed
EP-0490589-B1 Styryloxy compounds and polymers thereof LOCTITE IRELAND LTD (IE) 1995-03-08 EP disclosed
US-5373032-A Hardness, flexible, wear and chemical resistant protective coatings ISP INVESTMENTS INC. (US) 1994-12-13 US disclosed