Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KEAP1 | Q14145 | 1/20 | 0.31 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.30 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704502 | 0.82 | HTT (0.33) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL7988774 | 0.82 | KEAP1 (0.32) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL1533116 | 0.78 | GRIK1 (0.40) | KEAP1NFE2L2 | |
| SCHEMBL1263148 | 0.78 | GRIK1 (0.40) | KEAP1NFE2L2 | |
| SCHEMBL15410424 | 0.76 | GRIK1 (0.39) | KEAP1NFE2L2 | |
| SCHEMBL7988737 | 0.72 | MEN1 (0.33) | — | |
| SCHEMBL8395889 | 0.72 | CES2 (0.36) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL873007 | 0.71 | KEAP1 (0.42) | KEAP1NFE2L2CES2CES1 | |
| SCHEMBL2846765 | 0.71 | KEAP1 (0.42) | KEAP1NFE2L2CES2CES1 | |
| Bicarbonate SCHEMBL7556709 | 0.69 | CES2 (0.38) | KEAP1NFE2L2CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9465291-B2 | Radiation-sensitive resin composition, polymer, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-20140186771-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2014-07-03 | — | — | US | disclosed |
| US-8609318-B2 | Radiation-sensitive resin composition, method for forming resist pattern and polymer | JSR CORPORATION (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20120034560-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER | JSR CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |