SCHEMBL1263537

SCHEMBL1263537

CC(=O)OC(C)COC(=O)[C@@H]1CCCN1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TLR2 O60603 2/20 0.35
PRCP P42785 2/20 0.35
TSHR P16473 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM4 P08173 1/20 0.34
CHRM1 P11229 1/20 0.34
TBXA2R P21731 1/20 0.34
DPP7 Q9UHL4 2/20 0.34
GALR3 O60755 1/20 0.33
MAPT P10636 1/20 0.33
BLM P54132 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
DPP4 P27487 2/20 0.33
FAP Q12884 1/20 0.33
DPP8 Q6V1X1 1/20 0.33
DPP9 Q86TI2 1/20 0.33
NOS2 P35228 2/20 0.32
NOS3 P29474 1/20 0.32
NOS1 P29475 1/20 0.32
CYP1A2 P05177 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8840314 0.91 PRCP (0.39) TLR2PRCPDPP7DPP4FAP
SCHEMBL3714016 0.86 RAB9A (0.39) TLR2PRCPTSHRDPP7DPP4
SCHEMBL10363588 0.86 RAB9A (0.39) TLR2PRCPTSHRDPP7DPP4
SCHEMBL17732291 0.81 PRCP (0.38) TLR2PRCPDPP7DPP4FAP
SCHEMBL5539757 0.81 RAB9A (0.38) TLR2PRCPTSHRCHRM2CHRM4
SCHEMBL24587253 0.78 TLR2 (0.40) TLR2PRCPDPP7DPP4FAP
SCHEMBL27114716 0.78 TLR2 (0.40) TLR2PRCPDPP7DPP4FAP
SCHEMBL11253690 0.78 TLR2 (0.36) TLR2PRCPDPP7DPP4FAP
SCHEMBL13728121 0.77 ADRB2 (0.36) TLR2PRCPTSHRCYP3A4CYP2D6
SCHEMBL14887225 0.75 PRCP (0.44) TLR2PRCPDPP7DPP4NOS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1981074-B1 ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE JSR CORP (JP) 2011-06-22 EP disclosed
US-7893538-B2 Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device JSR CORPORATION (JP) 2011-02-22 US disclosed
US-20100007025-A1 ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2010-01-14 US disclosed
EP-1981074-A1 ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE JSR Corporation (JP) 2008-10-15 EP disclosed