Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 4/20 | 0.43 |
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL565735 | 0.90 | HTT (0.43) | ACHEEGFRERBB2HTTKMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL1130584 | 0.87 | KDM4E (0.40) | ACHEKMT2ATDP1GAAMMP1 | |
| SCHEMBL565171 | 0.84 | LTA4H (0.55) | ACHEHTTLTA4H | |
| Trifluoromethanesulfonic Acid SCHEMBL565741 | 0.84 | ACHE (0.45) | ACHEEGFRERBB2HTTKMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL1455740 | 0.83 | EGFR (0.44) | EGFRERBB2GAAMMP1MMP13 | |
| Hydrochloric Acid SCHEMBL6277766 | 0.83 | LTA4H (0.53) | ACHEHTTLTA4HTDP1 | |
| SCHEMBL2289588 | 0.83 | LTA4H (0.58) | ACHEHTTLTA4HTDP1 | |
| SCHEMBL23069371 | 0.82 | LTA4H (0.49) | ACHEHTTKMT2ALTA4H | |
| SCHEMBL21747569 | 0.82 | LTA4H (0.49) | ACHEEGFRERBB2HTTLTA4H | |
| Fluoride Ion SCHEMBL4075058 | 0.81 | LTA4H (0.52) | ACHEEGFRERBB2HTTLTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-9069245-B2 | Near-infrared absorptive layer-forming composition and multilayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-30 | — | — | US | disclosed |
| EP-1788433-B1 | Silicon-containing film forming composition and substrate processing method | SHINETSU CHEMICAL CO (JP) | 2014-07-09 | — | — | EP | disclosed |
| US-8722307-B2 | Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-13 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-8455176-B2 | Coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-04 | — | — | US | disclosed |
| US-8323536-B2 | Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-04 | — | — | US | disclosed |
| US-20120301828-A1 | NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM COMPRISING NEAR-INFRARED ABSORPTIVE LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2012-11-29 | — | — | US | disclosed |
| US-8313890-B2 | Antireflective coating composition, antireflective coating, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | disclosed |
| US-7879530-B2 | Antireflective coating composition, antireflective coating, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-01 | — | — | US | disclosed |
| US-20100151381-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING , AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20100119972-A1 | COATING COMPOSITION | MERCK PATENT GMBH (DE) | 2010-05-13 | — | — | US | disclosed |
| US-7678529-B2 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-16 | — | — | US | disclosed |
| EP-1788012-B1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | SHINETSU CHEMICAL CO (JP) | 2009-04-08 | — | — | EP | disclosed |
| US-20090087799-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20070117044-A1 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-24 | — | — | US | disclosed |
| US-20070117252-A1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-24 | — | — | US | disclosed |
| EP-1788012-A1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1788433-A2 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100119972-A1 | COATING COMPOSITION | S100A9, CAPG, C5 | ACHE 2707/4885EGFR 416/4885ERBB2 2235/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.