Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | ACHE | P22303 | 4/20 | 0.41 |
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | EGFR | P00533 | 1/20 | 0.40 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | PTGES | O14684 | 1/20 | 0.38 |
| ▸ | TAS2R14 | Q9NYV8 | 1/20 | 0.38 |
| ▸ | TAS2R8 | Q9NYW2 | 1/20 | 0.38 |
| ▸ | CXCR3 | P49682 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL565741 | 0.95 | ACHE (0.45) | HTTKCNH2ALDH1A1ACHELTA4H | |
| Trifluoromethanesulfonic Acid SCHEMBL1269460 | 0.90 | ACHE (0.43) | HTTACHELTA4HEGFRERBB2 | |
| Trifluoromethanesulfonic Acid SCHEMBL2334073 | 0.88 | ALDH1A1 (0.45) | HTTKCNH2ALDH1A1ACHEEGFR | |
| Trifluoromethanesulfonic Acid SCHEMBL565680 | 0.87 | GPR3 (0.40) | KCNH2ALDH1A1ACHETDP1 | |
| SCHEMBL565099 | 0.87 | HTT (0.37) | HTTALDH1A1ACHELTA4HEGFR | |
| Trifluoromethanesulfonic Acid SCHEMBL565684 | 0.85 | GPR3 (0.41) | KCNH2ACHETAS2R14 | |
| SCHEMBL565171 | 0.84 | LTA4H (0.55) | HTTACHELTA4H | |
| Trifluoromethanesulfonic Acid SCHEMBL1455736 | 0.83 | PKM (0.46) | KCNH2ALDH1A1ACHEEGFRERBB2 | |
| SCHEMBL2289588 | 0.83 | LTA4H (0.58) | HTTALDH1A1ACHELTA4HTDP1 | |
| Hydrochloric Acid SCHEMBL6277766 | 0.83 | LTA4H (0.53) | HTTALDH1A1ACHELTA4HTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022017815-A1 | ROOM TEMPERATURE STABLE, ELECTRICALLY CONDUCTIVE 1K EPOXY FORMULATION | HENKEL AG & CO. KGAA (DE) | 2022-01-27 | — | — | WO | claimed |
| US-8729166-B2 | Polymer composition for microelectronic assembly | PROMERUS, LLC (US) | 2014-05-20 | — | — | US | claimed |
| US-20140024750-A1 | Polymer Composition for Microelectronic Assembly | PROMERUS, LLC (US) | 2014-01-23 | — | — | US | claimed |
| US-20120034387-A1 | Polymer Composition for Microelectronic Assembly | PROMERUS LLC (US) | 2012-02-09 | — | — | US | claimed |
| US-20240427238-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2024-12-26 | — | — | US | disclosed |
| CN-118103775-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| WO-2023063148-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | 日産化学株式会社 | 2023-04-20 | — | — | WO | disclosed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-9069245-B2 | Near-infrared absorptive layer-forming composition and multilayer film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-30 | — | — | US | disclosed |
| EP-1788433-B1 | Silicon-containing film forming composition and substrate processing method | SHINETSU CHEMICAL CO (JP) | 2014-07-09 | — | — | EP | disclosed |
| US-8729166-B2 | Polymer composition for microelectronic assembly | PROMERUS, LLC (US) | 2014-05-20 | — | — | US | disclosed |
| EP-1788012-B1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | SHINETSU CHEMICAL CO (JP) | 2009-04-08 | — | — | EP | disclosed |
| US-20090087799-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20070117044-A1 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-24 | — | — | US | disclosed |
| US-20070117252-A1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-24 | — | — | US | disclosed |
| EP-1788012-A1 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1788433-A2 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| WO-2005097883-A2 | METHOD OF PRODUCING A CROSSLINKED COATING IN THE MANUFACTURE OF INTEGRATED CIRCUITS | KING INDUSTRIES, INC. (US) | 2005-10-20 | — | — | WO | disclosed |
| US-20050215713-A1 | Method of producing a crosslinked coating in the manufacture of integrated circuits | KING INDUSTRIES, INC. | 2005-09-29 | — | — | US | disclosed |