Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 5/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 1/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | MME | P08473 | 2/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL873471 | 0.90 | ALDH1A1 (0.58) | NPC1RAB9AALDH1A1 | |
| SCHEMBL12191612 | 0.90 | ALDH1A1 (0.58) | NPC1RAB9AALDH1A1 | |
| SCHEMBL8954882 | 0.90 | ALDH1A1 (0.58) | NPC1RAB9AALDH1A1 | |
| Hydrochloric Acid SCHEMBL28136733 | 0.88 | ALDH1A1 (0.56) | ALDH1A1 | |
| SCHEMBL27652862 | 0.85 | ALDH1A1 (0.53) | RAB9AALDH1A1 | |
| SCHEMBL8085256 | 0.85 | RAB9A (0.53) | NAAANPC1RAB9AMAPTALDH1A1 | |
| SCHEMBL14462588 | 0.83 | L3MBTL1 (0.60) | — | |
| SCHEMBL2742150 | 0.83 | MEN1 (0.52) | ALDH1A1 | |
| SCHEMBL10049479 | 0.82 | ALDH1A1 (0.52) | NPC1RAB9AMAPTALDH1A1 | |
| SCHEMBL28178911 | 0.82 | NAAA (0.50) | NAAANPC1RAB9AALDH1A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8349535-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20110081612-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2011-04-07 | — | — | US | disclosed |