SCHEMBL12764282

SCHEMBL12764282

C=CC(=O)N1C(=O)CCCCC1F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GSK3B P49841 1/20 0.30
MEN1 O00255 1/20 0.30
ALDH1A1 P00352 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12764291 0.95 MEN1 (0.33) GSK3BMEN1ALDH1A1KMT2A
SCHEMBL12764284 0.88 GSK3B (0.32) GSK3B
SCHEMBL12764329 0.75 CHRM2 (0.34) MEN1KMT2A
SCHEMBL12015339 0.73 RIPK1 (0.33)
SCHEMBL12764305 0.70 CHRM2 (0.35) MEN1ALDH1A1KMT2A
SCHEMBL11223449 0.69 ACE (0.49) GSK3B
SCHEMBL12764307 0.68 CHRM2 (0.36) GSK3BMEN1KMT2A
SCHEMBL9915937 0.67 SRC (0.31)
SCHEMBL12764298 0.67 NPC1 (0.32) GSK3BKMT2A
SCHEMBL12017034 0.66 ALDH1A1 (0.30) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9268226-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-23 US disclosed
US-9268226-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-23 US disclosed
US-20140038105-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-02-06 US disclosed
US-20140038105-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-02-06 US disclosed
US-20110053082-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-03 US disclosed
US-20110053082-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-03 US disclosed