SCHEMBL12793095

SCHEMBL12793095

C=C(C)C(=O)OCC(COC(=O)C(C)(C)CC)OC(=O)C(=C)C

nearest known ligand 0.46

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.46
▸ PRKCA P17252 1/20 0.38
▸ THRB P10828 1/20 0.37
▸ ALDH1A1 P00352 2/20 0.32
▸ LMNA P02545 1/20 0.30
▸ AR P10275 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16864561 0.90 TSHR (0.39) TSHRPRKCATHRB
SCHEMBL11920352 0.85 TSHR (0.44) TSHRPRKCATHRBALDH1A1
SCHEMBL14666170 0.85 TSHR (0.39) TSHRPRKCATHRBALDH1A1LMNA
SCHEMBL12793093 0.85 PRKCA (0.33) TSHRPRKCATHRB
SCHEMBL13309525 0.84 TSHR (0.53) TSHRPRKCATHRBALDH1A1
SCHEMBL279041 0.84 TSHR (0.49) TSHRPRKCATHRBALDH1A1LMNA
SCHEMBL9883773 0.84 THRB (0.33) TSHRPRKCATHRBALDH1A1LMNA
SCHEMBL35507 0.83 TSHR (0.63) TSHRPRKCATHRBALDH1A1LMNA
SCHEMBL2739642 0.83 TSHR (0.40) TSHRPRKCATHRBALDH1A1
SCHEMBL12793084 0.83 TSHR (0.47) TSHRPRKCATHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11827727-B2 Photo-alignment polymer, binder composition, binder layer, optical laminate, optical laminate manufacturing method, and image display device FUJIFILM CORPORATION (JP) 2023-11-28 — — US disclosed
US-20230167216-A1 PHOTO-ALIGNMENT POLYMER, BINDER COMPOSITION, BINDER LAYER, OPTICAL LAMINATE, OPTICAL LAMINATE MANUFACTURING METHOD, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-06-01 — — US disclosed
US-8940476-B2 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film FUJIFILM CORPORATION (JP) 2015-01-27 — — US disclosed
US-8511811-B2 Ink composition, ink set and image forming method FUJIFILM CORPORATION (JP) 2013-08-20 — — US disclosed
US-20120264054-A1 PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-10-18 — — US disclosed
US-20110057985-A1 INK COMPOSITION, INK SET AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2011-03-10 — — US disclosed
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