SCHEMBL12836372

SCHEMBL12836372

CC1=CCC(C(=O)O)CC1C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 5/20 0.40
▸ ALOX15 P16050 1/20 0.40
▸ TP53 P04637 1/20 0.39
▸ ABAT P80404 1/20 0.37
▸ LMNA P02545 2/20 0.33
▸ ALDH1A1 P00352 3/20 0.32
▸ AKR1C3 P42330 1/20 0.32
▸ AKR1C1 Q04828 1/20 0.32
▸ POLB P06746 1/20 0.32
▸ APLNR P35414 1/20 0.31
▸ KDM4E B2RXH2 1/20 0.31
▸ USP2 O75604 1/20 0.31
▸ HPGD P15428 1/20 0.31
▸ NPSR1 Q6W5P4 1/20 0.31
▸ HSD17B10 Q99714 1/20 0.31
▸ MEN1 O00255 1/20 0.31
▸ KMT2A Q03164 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ FFAR1 O14842 1/20 0.30
▸ RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16884691 0.84 TSHR (0.44) TSHRALOX15TP53LMNAALDH1A1
SCHEMBL13383605 0.80 TSHR (0.61) TSHRALOX15TP53ABATLMNA
SCHEMBL26805245 0.78 ABAT (0.36) TSHRABATLMNAAKR1C3AKR1C1
SCHEMBL720412 0.69 — —
SCHEMBL1243286 0.68 — —
SCHEMBL19916671 0.67 TSHR (0.36) TSHRALOX15TP53
Hydrogen Sulfide SCHEMBL15657642 0.67 — —
SCHEMBL937318 0.65 LMNA (0.60) TSHRALOX15LMNAALDH1A1POLB
SCHEMBL937050 0.65 LMNA (0.60) TSHRALOX15LMNAALDH1A1POLB
SCHEMBL1037667 0.65 LMNA (0.60) TSHRALOX15LMNAALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011025065-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-03-03 — — WO disclosed
EP-1748318-A2 Chemical amplification-type resist composition and production process thereof Fuji Photo Film Co., Ltd. (JP) 2007-01-31 — — EP disclosed
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