SCHEMBL12837458

SCHEMBL12837458

C=CC(=O)OC(=C)CCC(=O)OC1CC(C)OC1=O

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 2/20 0.34
NLRP3 Q96P20 1/20 0.31
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12837457 0.84 MMP3 (0.34) MMP3ATM
SCHEMBL1697109 0.82 TSHR (0.36) MMP3NLRP3ATM
SCHEMBL685651 0.80 KMT2A (0.33) ATM
SCHEMBL685120 0.80 TSHR (0.32)
SCHEMBL12501613 0.79 MAPK1 (0.42)
SCHEMBL12783106 0.76 ZDHHC20 (0.38) MMP3NLRP3ATM
SCHEMBL12123898 0.75 TSHR (0.33)
SCHEMBL12783082 0.73 ZDHHC20 (0.32) ATM
SCHEMBL12501615 0.73 CTSV (0.33)
SCHEMBL1697100 0.72 ALDH1A1 (0.36) MMP3ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110053082-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-03 US disclosed