SCHEMBL12903608

SCHEMBL12903608

CCC(O)COC(=O)c1ccc2cc(O)ccc2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 11/20 0.54
ADRB1 P08588 11/20 0.54
ADRB3 P13945 11/20 0.54
ESR1 P03372 2/20 0.45
CA12 O43570 2/20 0.45
CA1 P00915 2/20 0.45
CA2 P00918 2/20 0.45
CA7 P43166 2/20 0.45
CA9 Q16790 2/20 0.45
CA14 Q9ULX7 2/20 0.45
ESR2 Q92731 1/20 0.45
ALDH1A1 P00352 1/20 0.43
CHRM1 P11229 1/20 0.43
TSHR P16473 1/20 0.43
SLC6A2 P23975 1/20 0.43
KDR P35968 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
PTPN1 P18031 1/20 0.42
MAPT P10636 1/20 0.42
MEN1 O00255 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18234066 0.87 ADRB2 (0.53) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL6650961 0.87 ALDH1A1 (0.51) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL6940148 0.86 MAPT (0.60) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL9700051 0.86 MAPT (0.60) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL19134456 0.85 ADRB2 (0.53) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL13852727 0.85 ADRB2 (0.68) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL17280572 0.84 ADRB2 (0.60) ADRB2ADRB1ADRB3
SCHEMBL12999567 0.84 ADRB2 (0.53) ADRB2ADRB1ADRB3MAPTMEN1
SCHEMBL6655844 0.84 ADRB2 (0.51) ADRB2ADRB1ADRB3ESR1CA12
SCHEMBL17280571 0.82 ADRB2 (0.55) ADRB2ADRB1ADRB3ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10703917-B2 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-07-07 US disclosed
US-20170313889-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-11-02 US disclosed
US-20170313889-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-11-02 US disclosed
US-9708493-B2 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-18 US disclosed
US-9708493-B2 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-18 US disclosed
US-20160009924-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-01-14 US disclosed
US-20160009924-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-01-14 US disclosed
US-8883407-B2 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-11-11 US disclosed
US-8883407-B2 Coating compositions suitable for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-11-11 US disclosed
US-20110003250-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-01-06 US disclosed
US-20110003250-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-01-06 US disclosed
EP-2261738-A2 Coating compositions suitable for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-15 EP disclosed
US-7846638-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-07 US disclosed
EP-1560070-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2009-12-30 EP disclosed
US-7425399-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-09-16 US disclosed
US-20080206680-A1 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-08-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110003250-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST DHPS, HAAO, FTO ADRB2 1280/4885ADRB1 2298/4885ADRB3 2216/4885
US-10703917-B2 Coating compositions suitable for use with an overcoated photoresist DHPS, HAAO, FTO ADRB2 1280/4885ADRB1 2298/4885ADRB3 2216/4885
US-20170313889-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST DHPS, HAAO, FTO ADRB2 1280/4885ADRB1 2298/4885ADRB3 2216/4885
US-20160009924-A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST DHPS, HAAO, FTO ADRB2 1280/4885ADRB1 2298/4885ADRB3 2216/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.