SCHEMBL12952936

SCHEMBL12952936

CC(C)=CC(c1cccc(O)c1)C(C)(C)C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB1 P08588 2/20 0.47
ADRA1A P35348 2/20 0.47
MIF P14174 1/20 0.47
HTR2A P28223 1/20 0.47
HTR2B P41595 1/20 0.47
HIF1A Q16665 4/20 0.41
SLC6A3 Q01959 2/20 0.41
ADRB2 P07550 1/20 0.41
HTR1A P08908 1/20 0.41
ADRA2A P08913 1/20 0.41
ADRB3 P13945 1/20 0.41
TSHR P16473 1/20 0.41
ADRA2B P18089 1/20 0.41
ADRA2C P18825 1/20 0.41
NFKB1 P19838 1/20 0.41
DRD1 P21728 1/20 0.41
HTR7 P34969 1/20 0.41
ADRA1B P35368 1/20 0.41
DRD3 P35462 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13063293 0.81 TRPA1 (0.40) SLC6A3ADRA2AADRA2CLMNACYP3A4
SCHEMBL13359071 0.79 PTGS1 (0.35) CYP3A4ACHE
SCHEMBL903568 0.77 ESR1 (0.43) ADRA1AHIF1ASLC6A3HTR1ATSHR
SCHEMBL6277106 0.75 ADRB1 (0.55) ADRB1ADRA1AMIFHTR2AHTR2B
SCHEMBL30317737 0.73 ADRB1 (0.58) ADRB1ADRA1AMIFHTR2AHTR2B
SCHEMBL21291430 0.73 ADRB1 (0.58) ADRB1ADRA1AMIFHTR2AHTR2B
SCHEMBL12087028 0.73 ADRB1 (0.63) ADRB1ADRA1AMIFHTR2AHTR2B
SCHEMBL14443273 0.73 ADRB1 (0.58) ADRB1ADRA1AMIFHTR2AHTR2B
SCHEMBL14219817 0.72 TSHR (0.49) TSHRNFKB1BLMCYP3A4ALDH1A1
SCHEMBL14217423 0.72 ADRB1 (0.56) ADRB1ADRA1AMIFHTR2AHTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7875746-B2 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2011-01-25 US disclosed
US-7749679-B2 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2010-07-06 US disclosed
US-7629107-B2 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition FUJIFILM CORPORATION (JP) 2009-12-08 US disclosed
US-20080085464-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUNDS FOR USE IN THE POSITIVE PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF THE POLYMER COMPOUNDS, COMPOUNDS FOR USE IN THE MANUFACTURE OF THE POLYMER COMPOUNDS, AND PATTERN-FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-04-10 US disclosed
US-20070148592-A1 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-06-28 US disclosed