SCHEMBL13063293

SCHEMBL13063293

CC(C)=CC(c1ccccc1)C(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 3/20 0.40
SLC6A4 P31645 3/20 0.38
SLC6A2 P23975 2/20 0.38
SLC6A3 Q01959 2/20 0.38
RIPK1 Q13546 2/20 0.37
ATM Q13315 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
AOC3 Q16853 1/20 0.36
LMNA P02545 1/20 0.34
ADRA2A P08913 1/20 0.33
ADRA2C P18825 1/20 0.33
HPGD P15428 1/20 0.33
ALDH1A1 P00352 1/20 0.33
ESR1 P03372 1/20 0.33
CYP3A4 P08684 1/20 0.33
ESR2 Q92731 1/20 0.33
NOS2 P35228 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14192207 0.84 L3MBTL1 (0.36) TRPA1SLC6A4SLC6A2SLC6A3ATM
SCHEMBL903568 0.83 ESR1 (0.43) SLC6A4SLC6A2SLC6A3LMNAHPGD
SCHEMBL12952936 0.81 ADRB1 (0.47) SLC6A4SLC6A3LMNAADRA2AADRA2C
SCHEMBL10077946 0.80 CYP1A2 (0.40) LMNAHPGDALDH1A1CYP3A4
SCHEMBL12448026 0.80 CYP1A2 (0.40) LMNAHPGDALDH1A1CYP3A4
SCHEMBL10077145 0.80 AOC3 (0.37) TRPA1AOC3LMNA
SCHEMBL10125275 0.80 NR1H4 (0.42) L3MBTL1HPGDALDH1A1
SCHEMBL10077075 0.79 MAOB (0.50) SLC6A2SLC6A3LMNA
SCHEMBL13588182 0.77 ALDH1A1 (0.43) L3MBTL1AOC3LMNAALDH1A1ESR2
SCHEMBL10248843 0.76 ACACB (0.41) SLC6A4SLC6A2SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858287-B2 Photosensitive resin, and photosensitive composition HYOGO PREFECTURE (JP) 2010-12-28 US disclosed
US-20090142697-A1 PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI CO., LTD. (JP) 2009-06-04 US disclosed
US-7510820-B2 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed