SCHEMBL12994264

SCHEMBL12994264

CNC(=O)c1cc(-c2ccc(C(=O)O)c(C(=O)Nc3ccc(-c4ccc(C)cc4C)c(C(F)(F)F)c3)c2)ccc1OC=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ S1PR1 P21453 11/20 0.39
▸ S1PR3 Q99500 6/20 0.39
▸ BRAF P15056 1/20 0.38
▸ EIF2AK3 Q9NZJ5 1/20 0.38
▸ EIF2AK4 Q9P2K8 1/20 0.38
▸ SCN10A Q9Y5Y9 1/20 0.37
▸ HTT P42858 2/20 0.36
▸ LMNA P02545 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ ADRB2 P07550 1/20 0.36
▸ GPR183 P32249 1/20 0.36
▸ APLNR P35414 1/20 0.36
▸ S1PR5 Q9H228 1/20 0.36
▸ SORT1 Q99523 1/20 0.35
▸ APOB P04114 1/20 0.35
▸ MTTP P55157 1/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ NPC1 O15118 1/20 0.35
▸ MAPT P10636 1/20 0.35
▸ RAB9A P51151 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17827630 0.87 S1PR1 (0.45) S1PR1S1PR3HTTLMNASMN1; SMN2
SCHEMBL12994272 0.86 S1PR1 (0.47) S1PR1S1PR3HTTMEN1NPC1
SCHEMBL16263581 0.83 S1PR1 (0.46) S1PR1S1PR3HTTLMNASMN1; SMN2
SCHEMBL12894460 0.83 NR1H4 (0.44) MEN1NPC1RAB9AKMT2A
SCHEMBL12894458 0.79 MAPK1 (0.47) BRAFLMNAMEN1KMT2A
SCHEMBL10024745 0.77 SORT1 (0.44) S1PR1S1PR3HTTSORT1MEN1
SCHEMBL12605304 0.77 POLB (0.43) S1PR1S1PR3MAPTKMT2A
SCHEMBL15159007 0.77 SORT1 (0.40) S1PR1S1PR3HTTLMNASMN1; SMN2
SCHEMBL14370475 0.77 STK39 (0.41) BRAFEIF2AK3EIF2AK4SCN10AHTT
SCHEMBL15431057 0.75 S1PR1 (0.46) S1PR1S1PR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8728705-B2 Negative photosensitive material, photosensitive board employing the negative photosensitive material, and negative pattern forming method NITTO DENKO CORPORATION (JP) 2014-05-20 — — US disclosed
US-20130118788-A1 POLYIMIDE PRECURSOR COMPOSITION, AND WIRING CIRCUIT BOARD EMPLOYING THE COMPOSITION NITTO DENKO CORPORATION (JP) 2013-05-16 — — US disclosed
US-20100304298-A1 NEGATIVE PHOTOSENSITIVE MATERIAL, PHOTOSENSITIVE BOARD EMPLOYING THE NEGATIVE PHOTOSENSITIVE MATERIAL, AND NEGATIVE PATTERN FORMING METHOD NITTO DENKO CORPORATION (JP) 2010-12-02 — — US disclosed
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